JPS5562976A - Coating composition - Google Patents

Coating composition

Info

Publication number
JPS5562976A
JPS5562976A JP14114779A JP14114779A JPS5562976A JP S5562976 A JPS5562976 A JP S5562976A JP 14114779 A JP14114779 A JP 14114779A JP 14114779 A JP14114779 A JP 14114779A JP S5562976 A JPS5562976 A JP S5562976A
Authority
JP
Japan
Prior art keywords
coating composition
coating
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14114779A
Other languages
Japanese (ja)
Other versions
JPS6032360B2 (en
Inventor
Uiriamu Kootonii Robaato
Jiyon Paakaa Suchiibun
Chiyaarusu Suretsudogooru Aran
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coates Brothers and Co Ltd
Original Assignee
Coates Brothers and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coates Brothers and Co Ltd filed Critical Coates Brothers and Co Ltd
Publication of JPS5562976A publication Critical patent/JPS5562976A/en
Publication of JPS6032360B2 publication Critical patent/JPS6032360B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/026Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/285Permanent coating compositions
    • H05K3/287Photosensitive compositions
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0783Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
JP54141147A 1978-11-01 1979-10-31 Method of forming a solder pattern on a conductive metal layer Expired JPS6032360B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB42748/78 1978-11-01
GB7842748 1978-11-01

Publications (2)

Publication Number Publication Date
JPS5562976A true JPS5562976A (en) 1980-05-12
JPS6032360B2 JPS6032360B2 (en) 1985-07-27

Family

ID=10500726

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54141147A Expired JPS6032360B2 (en) 1978-11-01 1979-10-31 Method of forming a solder pattern on a conductive metal layer

Country Status (10)

Country Link
JP (1) JPS6032360B2 (en)
BR (1) BR7907098A (en)
CH (1) CH645395A5 (en)
DE (1) DE2944097A1 (en)
DK (1) DK460579A (en)
FR (1) FR2440978B1 (en)
HK (1) HK75587A (en)
IT (1) IT1124219B (en)
NO (1) NO159729C (en)
SE (1) SE445647B (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5726846A (en) * 1980-05-27 1982-02-13 Du Pont Photosensitive layer
JPS62178542A (en) * 1986-01-30 1987-08-05 Nippon Kayaku Co Ltd (meth)acrylic acid ester and reactive compound for coating or printing ink
JPH05320312A (en) * 1990-11-20 1993-12-03 W R Grace & Co Production of unsaturated epoxy ester resin and carboxylatedunsaturated epoxy ester resin and photosensitive resin composition containing same
US8399583B2 (en) 2008-03-05 2013-03-19 Nippon Shokubai Co., Ltd. Polymer, curable resin composition, cured product, and article

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0281808B1 (en) * 1987-03-12 1994-07-20 Siemens Aktiengesellschaft Radiation cross-linkable polymer system for application as photoresist and dielectric for micro wiring

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1549956A (en) * 1967-03-02 1968-12-13
US3661576A (en) * 1970-02-09 1972-05-09 Brady Co W H Photopolymerizable compositions and articles
US3876432A (en) * 1972-09-11 1975-04-08 Sun Chemical Corp Fatty ester modified epoxy resin photopolymerizable compositions
DE2326314C2 (en) * 1973-05-23 1983-10-27 Siemens AG, 1000 Berlin und 8000 München Process for the production of relief structures
JPS5017827A (en) * 1973-06-18 1975-02-25
FR2255629B1 (en) * 1973-12-20 1976-10-22 Ibm
US4072592A (en) * 1974-05-20 1978-02-07 Mobil Oil Corporation Radiation curable coating
US4003877A (en) * 1974-05-24 1977-01-18 Dynachem Corporation Photopolymerizable screen printing inks for permanent coatings prepared from aryloxyalkyl compositions
DE2534012C3 (en) * 1975-07-30 1981-05-14 Bayer Ag, 5090 Leverkusen Process for the production of binders
DE2702660C3 (en) * 1976-01-27 1980-07-10 Ppg Industries, Inc., Pittsburgh, Pa. (V.St.A.) Radiation-curable coating compositions and process for their preparation
JPS52117985A (en) * 1976-03-30 1977-10-03 Hitachi Chem Co Ltd Photosensitive polymer composition
CA1116919A (en) * 1976-10-27 1982-01-26 Joseph E. Gervay Flame retardant radiation sensitive element of photopolymerizable composition containing halogen and an acrylonitrile containing polymeric binder

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5726846A (en) * 1980-05-27 1982-02-13 Du Pont Photosensitive layer
JPS62178542A (en) * 1986-01-30 1987-08-05 Nippon Kayaku Co Ltd (meth)acrylic acid ester and reactive compound for coating or printing ink
JPH05320312A (en) * 1990-11-20 1993-12-03 W R Grace & Co Production of unsaturated epoxy ester resin and carboxylatedunsaturated epoxy ester resin and photosensitive resin composition containing same
US8399583B2 (en) 2008-03-05 2013-03-19 Nippon Shokubai Co., Ltd. Polymer, curable resin composition, cured product, and article

Also Published As

Publication number Publication date
NO159729B (en) 1988-10-24
CH645395A5 (en) 1984-09-28
JPS6032360B2 (en) 1985-07-27
HK75587A (en) 1987-10-23
DE2944097C2 (en) 1988-07-28
SE445647B (en) 1986-07-07
IT1124219B (en) 1986-05-07
FR2440978A1 (en) 1980-06-06
NO793475L (en) 1980-05-05
SE7909024L (en) 1980-05-02
IT7912796A0 (en) 1979-10-31
DK460579A (en) 1980-05-02
DE2944097A1 (en) 1980-05-14
NO159729C (en) 1989-02-01
BR7907098A (en) 1980-10-07
FR2440978B1 (en) 1985-07-19

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