JPS5570032A - Wafer scribing line detector - Google Patents

Wafer scribing line detector

Info

Publication number
JPS5570032A
JPS5570032A JP14327178A JP14327178A JPS5570032A JP S5570032 A JPS5570032 A JP S5570032A JP 14327178 A JP14327178 A JP 14327178A JP 14327178 A JP14327178 A JP 14327178A JP S5570032 A JPS5570032 A JP S5570032A
Authority
JP
Japan
Prior art keywords
wafer
light
scribing line
center
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14327178A
Other languages
Japanese (ja)
Other versions
JPS5643612B2 (en
Inventor
Kiwao Nakazawa
Kyoichi Suwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Nippon Chemical Industrial Co Ltd
Original Assignee
Nippon Chemical Industrial Co Ltd
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Industrial Co Ltd, Nippon Kogaku KK filed Critical Nippon Chemical Industrial Co Ltd
Priority to JP14327178A priority Critical patent/JPS5570032A/en
Publication of JPS5570032A publication Critical patent/JPS5570032A/en
Publication of JPS5643612B2 publication Critical patent/JPS5643612B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Dicing (AREA)

Abstract

PURPOSE: To enable automatic detection of the scribing line on a wafer without visual check nor alignment mark by detecting scattered light from the wafer upon scanning of focused light on the wafer.
CONSTITUTION: A focused light 52 is scanned on a wafer 51 to vibrate by sine wave in x- and y-axes directions. There is separately provided a device for receiving scattered light from the wafer 51 of scanned focused light 52. Since the minimum of the received scattered light corresponds to the center of the scribing line on the wafer, the scattered light is detected to measure the displacement of the position from the scanning center of the light 52. The displacement thus measured is fed back to θ stage 54, x stage 55 and y stage 56 to move the position of the wafer 51 to thereby coincide the center of the scribing line with the center of the scanning of the light 52.
COPYRIGHT: (C)1980,JPO&Japio
JP14327178A 1978-11-22 1978-11-22 Wafer scribing line detector Granted JPS5570032A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14327178A JPS5570032A (en) 1978-11-22 1978-11-22 Wafer scribing line detector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14327178A JPS5570032A (en) 1978-11-22 1978-11-22 Wafer scribing line detector

Publications (2)

Publication Number Publication Date
JPS5570032A true JPS5570032A (en) 1980-05-27
JPS5643612B2 JPS5643612B2 (en) 1981-10-14

Family

ID=15334859

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14327178A Granted JPS5570032A (en) 1978-11-22 1978-11-22 Wafer scribing line detector

Country Status (1)

Country Link
JP (1) JPS5570032A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002098789A (en) * 2000-06-21 2002-04-05 Shibaura Mechatronics Corp Pellet detection method, pellet detection device and pellet removal device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002098789A (en) * 2000-06-21 2002-04-05 Shibaura Mechatronics Corp Pellet detection method, pellet detection device and pellet removal device

Also Published As

Publication number Publication date
JPS5643612B2 (en) 1981-10-14

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