JPS5572029A - Tray for semiconductor wafer - Google Patents
Tray for semiconductor waferInfo
- Publication number
- JPS5572029A JPS5572029A JP14618178A JP14618178A JPS5572029A JP S5572029 A JPS5572029 A JP S5572029A JP 14618178 A JP14618178 A JP 14618178A JP 14618178 A JP14618178 A JP 14618178A JP S5572029 A JPS5572029 A JP S5572029A
- Authority
- JP
- Japan
- Prior art keywords
- tray
- wafers
- semiconductor wafer
- vacuum chuck
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To facilitate vacuum chuck type attach/detach operation by making numbers of throughholes on a tray where wafers are mounted.
CONSTITUTION: Air vent holes 14 are provided on the surface of a tray where wafers drop from the vacuum chuck. This allows air left between the tray and wafers to be readily removed through the holes 14. The wafers are prevented from sliding on the surface and therefore easy to be positioned. When the wafer needs to be sucked, air easily moved between the wafer and tray thereby facilitating the operation.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14618178A JPS5572029A (en) | 1978-11-27 | 1978-11-27 | Tray for semiconductor wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14618178A JPS5572029A (en) | 1978-11-27 | 1978-11-27 | Tray for semiconductor wafer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5572029A true JPS5572029A (en) | 1980-05-30 |
Family
ID=15401958
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14618178A Pending JPS5572029A (en) | 1978-11-27 | 1978-11-27 | Tray for semiconductor wafer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5572029A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57183666U (en) * | 1981-05-18 | 1982-11-20 | ||
| JPS5881934U (en) * | 1981-11-30 | 1983-06-03 | 株式会社日立製作所 | Automatic continuous baking oven |
| JPS5922340A (en) * | 1982-07-29 | 1984-02-04 | Toshiba Corp | Electrostatic chucking device |
| JPS59189643A (en) * | 1983-04-13 | 1984-10-27 | Fujitsu Ltd | In-line-type treatment device |
| JPH05166916A (en) * | 1991-05-15 | 1993-07-02 | Applied Materials Inc | Method and apparatus for cooling a wafer |
| JP2002057209A (en) * | 2000-06-01 | 2002-02-22 | Tokyo Electron Ltd | Single wafer processing apparatus and single wafer processing method |
| US6926937B2 (en) | 2002-09-11 | 2005-08-09 | Entegris, Inc. | Matrix tray with tacky surfaces |
| US7108899B2 (en) | 2002-09-11 | 2006-09-19 | Entegris, Inc. | Chip tray with tacky surface |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5269578A (en) * | 1975-12-08 | 1977-06-09 | Hitachi Ltd | Wafer suscepter |
-
1978
- 1978-11-27 JP JP14618178A patent/JPS5572029A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5269578A (en) * | 1975-12-08 | 1977-06-09 | Hitachi Ltd | Wafer suscepter |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57183666U (en) * | 1981-05-18 | 1982-11-20 | ||
| JPS5881934U (en) * | 1981-11-30 | 1983-06-03 | 株式会社日立製作所 | Automatic continuous baking oven |
| JPS5922340A (en) * | 1982-07-29 | 1984-02-04 | Toshiba Corp | Electrostatic chucking device |
| JPS59189643A (en) * | 1983-04-13 | 1984-10-27 | Fujitsu Ltd | In-line-type treatment device |
| JPH05166916A (en) * | 1991-05-15 | 1993-07-02 | Applied Materials Inc | Method and apparatus for cooling a wafer |
| JP2002057209A (en) * | 2000-06-01 | 2002-02-22 | Tokyo Electron Ltd | Single wafer processing apparatus and single wafer processing method |
| US6926937B2 (en) | 2002-09-11 | 2005-08-09 | Entegris, Inc. | Matrix tray with tacky surfaces |
| US7108899B2 (en) | 2002-09-11 | 2006-09-19 | Entegris, Inc. | Chip tray with tacky surface |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS53108390A (en) | Semiconductor device and its manufacture | |
| JPS5572029A (en) | Tray for semiconductor wafer | |
| JPS5434751A (en) | Washing method for silicon wafer | |
| JPS5680141A (en) | Manufacture device of semiconductor | |
| JPS5318967A (en) | Wafer sucking jig | |
| JPS5339874A (en) | Vacuum pincette | |
| JPS51135052A (en) | Automatic slate transfer machine | |
| JPS57206046A (en) | Wafer conveying device | |
| JPS5375866A (en) | Wafer transfer device | |
| JPS5651732A (en) | Exposure processing method | |
| JPS52103971A (en) | Semiconductor device | |
| JPS5258480A (en) | Wafer pick-up device | |
| JPS54984A (en) | Containing tool for semiconductor wafer | |
| JPS5441665A (en) | Manufacture for semiconductor device | |
| JPS5295166A (en) | Wafer dryer | |
| JPS5437468A (en) | Breaking device for semiconductor wafer | |
| JPS5384684A (en) | Plasma etching device | |
| JPS54128667A (en) | Liquid phase epitaxial growth unit | |
| JPS5735323A (en) | Removal of photoresist film | |
| JPS5352370A (en) | Wafer susceptor | |
| JPS5361974A (en) | Production of semiconductor device | |
| JPS5242365A (en) | Tool for semiconductors | |
| JPS51114876A (en) | Semiconductor wafer surface processing equipment | |
| JPS5421173A (en) | Manufacture for semiconductor having oxide film | |
| JPS5391580A (en) | Manufacturing equipment for semiconductor device |