JPS5576558A - Astigmatism compensating and focusing device - Google Patents

Astigmatism compensating and focusing device

Info

Publication number
JPS5576558A
JPS5576558A JP15007478A JP15007478A JPS5576558A JP S5576558 A JPS5576558 A JP S5576558A JP 15007478 A JP15007478 A JP 15007478A JP 15007478 A JP15007478 A JP 15007478A JP S5576558 A JPS5576558 A JP S5576558A
Authority
JP
Japan
Prior art keywords
electron beam
astigmatism
waveform
signal waveform
focus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15007478A
Other languages
Japanese (ja)
Inventor
Kyoichi Miyauchi
Teiji Katsuta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP15007478A priority Critical patent/JPS5576558A/en
Publication of JPS5576558A publication Critical patent/JPS5576558A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To compensate the astigmatism of electron beam and to focus by scanning essentially circularly a sample with a pre-determined pattern, detecting the waveform of the information signal and using the waveform.
CONSTITUTION: The electron beam 2 passed through the condenser lens 1 and iris 4 of an electron beam scanning device is scanned on a standard sample surface 10 with a pre-determined pattern, informations characterizing the pattern are detected with the detector 5 and introduced to the monitor 9, and signal waveform is observed. If the electron beam operates with astigmatism the width of the signal waveform varies, the astigmatism compensating coil 3 will be controlled, and if the electron beam is out of focus the shape of signal waveform varies, the condenser lens 1 will be controlled. Thus the astigmatism compensation and the focusing can be made easily and accurately without any experience and skill of a man.
COPYRIGHT: (C)1980,JPO&Japio
JP15007478A 1978-12-06 1978-12-06 Astigmatism compensating and focusing device Pending JPS5576558A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15007478A JPS5576558A (en) 1978-12-06 1978-12-06 Astigmatism compensating and focusing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15007478A JPS5576558A (en) 1978-12-06 1978-12-06 Astigmatism compensating and focusing device

Publications (1)

Publication Number Publication Date
JPS5576558A true JPS5576558A (en) 1980-06-09

Family

ID=15488944

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15007478A Pending JPS5576558A (en) 1978-12-06 1978-12-06 Astigmatism compensating and focusing device

Country Status (1)

Country Link
JP (1) JPS5576558A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5942750A (en) * 1982-08-31 1984-03-09 Shimadzu Corp Focus detection device for charged particle beam scanning microscope
JPWO2019186938A1 (en) * 2018-03-29 2021-02-25 株式会社日立ハイテク Charged particle beam device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5942750A (en) * 1982-08-31 1984-03-09 Shimadzu Corp Focus detection device for charged particle beam scanning microscope
JPWO2019186938A1 (en) * 2018-03-29 2021-02-25 株式会社日立ハイテク Charged particle beam device

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