JPS5577144A - Electron beam exposure method - Google Patents

Electron beam exposure method

Info

Publication number
JPS5577144A
JPS5577144A JP15159378A JP15159378A JPS5577144A JP S5577144 A JPS5577144 A JP S5577144A JP 15159378 A JP15159378 A JP 15159378A JP 15159378 A JP15159378 A JP 15159378A JP S5577144 A JPS5577144 A JP S5577144A
Authority
JP
Japan
Prior art keywords
electron beam
specimen
moving
exposure
engraving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15159378A
Other languages
Japanese (ja)
Inventor
Itsuo Yamamoto
Makoto Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP15159378A priority Critical patent/JPS5577144A/en
Publication of JPS5577144A publication Critical patent/JPS5577144A/en
Pending legal-status Critical Current

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  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To reduce the exposure time significantly by engraving a figure on a specimen reading out data corresponding to finely divided false regions thereof which are memorized in a memory when the engraving is made by moving the electron beam.
CONSTITUTION: All data related to the exposure are stored in a magnetic tape 1 beforehand. Proper data are sent to a degital electronic computer 2 having a direct memory access controller 3, whose output is applied to a high speed data transmission control mechanism. Then, the outout of the mechanism is applied to an electron beam exposure means 5 to irradiate a beam from an electronic gun G on a specimen 13 on a specimen base 12 arranged therein. The means 5 is arranged as follows: D/A converters 6, 8 and 10 are separately connected to the mechanism 4 to control an electron beam cross-section varying means 7, the first deflector 9 and the second deflector 11, while controlling a mechanism 14 of moving the pulse motor connected to the mechanism 4 thereby finely moving the specimen base.
COPYRIGHT: (C)1980,JPO&Japio
JP15159378A 1978-12-07 1978-12-07 Electron beam exposure method Pending JPS5577144A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15159378A JPS5577144A (en) 1978-12-07 1978-12-07 Electron beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15159378A JPS5577144A (en) 1978-12-07 1978-12-07 Electron beam exposure method

Publications (1)

Publication Number Publication Date
JPS5577144A true JPS5577144A (en) 1980-06-10

Family

ID=15521902

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15159378A Pending JPS5577144A (en) 1978-12-07 1978-12-07 Electron beam exposure method

Country Status (1)

Country Link
JP (1) JPS5577144A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57122528A (en) * 1981-01-23 1982-07-30 Nippon Telegr & Teleph Corp <Ntt> Drawing system for electron beam exposure apparatus
JPS57124433A (en) * 1981-01-23 1982-08-03 Nippon Telegr & Teleph Corp <Ntt> Patterning data processing for electron beam expossing device
JPS586130A (en) * 1981-07-03 1983-01-13 Fujitsu Ltd Correcting method for deflection of electron beam
JPS5811960U (en) * 1981-07-15 1983-01-25 株式会社三協精機製作所 small motor
JPS58154230A (en) * 1982-03-10 1983-09-13 Jeol Ltd Method of electron beam exposure
JPS60126826A (en) * 1983-12-13 1985-07-06 Fujitsu Ltd Electron beam exposing device
JPS6142845A (en) * 1984-08-04 1986-03-01 ライボルト‐ヘレーウス・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング Method and device for controlling focused state of deflectedelectron beam
JPS61126753A (en) * 1984-11-22 1986-06-14 Agency Of Ind Science & Technol High energy beam irradiation device
JPS62112845U (en) * 1986-01-08 1987-07-18

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5367365A (en) * 1976-11-29 1978-06-15 Nippon Telegr & Teleph Corp <Ntt> Correcting method for beam position
JPS53137672A (en) * 1977-05-06 1978-12-01 Nec Corp Arrangement graph drawing circuit

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5367365A (en) * 1976-11-29 1978-06-15 Nippon Telegr & Teleph Corp <Ntt> Correcting method for beam position
JPS53137672A (en) * 1977-05-06 1978-12-01 Nec Corp Arrangement graph drawing circuit

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57122528A (en) * 1981-01-23 1982-07-30 Nippon Telegr & Teleph Corp <Ntt> Drawing system for electron beam exposure apparatus
JPS57124433A (en) * 1981-01-23 1982-08-03 Nippon Telegr & Teleph Corp <Ntt> Patterning data processing for electron beam expossing device
JPS586130A (en) * 1981-07-03 1983-01-13 Fujitsu Ltd Correcting method for deflection of electron beam
JPS5811960U (en) * 1981-07-15 1983-01-25 株式会社三協精機製作所 small motor
JPS58154230A (en) * 1982-03-10 1983-09-13 Jeol Ltd Method of electron beam exposure
JPS60126826A (en) * 1983-12-13 1985-07-06 Fujitsu Ltd Electron beam exposing device
JPS6142845A (en) * 1984-08-04 1986-03-01 ライボルト‐ヘレーウス・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング Method and device for controlling focused state of deflectedelectron beam
JPS61126753A (en) * 1984-11-22 1986-06-14 Agency Of Ind Science & Technol High energy beam irradiation device
JPS62112845U (en) * 1986-01-08 1987-07-18

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