JPS6476660A - Electron beam exposure equipment - Google Patents

Electron beam exposure equipment

Info

Publication number
JPS6476660A
JPS6476660A JP62233223A JP23322387A JPS6476660A JP S6476660 A JPS6476660 A JP S6476660A JP 62233223 A JP62233223 A JP 62233223A JP 23322387 A JP23322387 A JP 23322387A JP S6476660 A JPS6476660 A JP S6476660A
Authority
JP
Japan
Prior art keywords
data
pattern
processing
electron beam
speed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62233223A
Other languages
Japanese (ja)
Other versions
JP2553102B2 (en
Inventor
Junichi Kai
Hiroshi Yasuda
Mamoru Yoneda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Miyachi Systems Co Ltd
Original Assignee
Fujitsu Ltd
Miyachi Systems Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd, Miyachi Systems Co Ltd filed Critical Fujitsu Ltd
Priority to JP62233223A priority Critical patent/JP2553102B2/en
Publication of JPS6476660A publication Critical patent/JPS6476660A/en
Application granted granted Critical
Publication of JP2553102B2 publication Critical patent/JP2553102B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To eliminate the wasteful time such as the processing time of a control system and allow the high-speed processing by dividing a pattern in sequence asynchronously with blanking data and transferring the positioning data of an electron beam synchronized with the clock signal to a pattern correcting unit. CONSTITUTION:The positioning data of an electron beam, rectangular shot data, and blanking data required to a rectangular shot pattern from one pattern data inputted to a pattern dividing unit 14 asynchronously with the blanking signal of a deflection deflector system and a deflection control system are independently processes in advance and temporarily stored in a shot data storage memory 18, i.e., high-speed FiFo memory. The data are then read out and processed as appropriate in response to the processing speed of the deflection system synchronously with the clock signal generated by a clock generating unit 19. The wasteful time such as the processing time of the control system generated between patterns is eliminated to allow the high-speed processing.
JP62233223A 1987-09-17 1987-09-17 Electron beam exposure system Expired - Fee Related JP2553102B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62233223A JP2553102B2 (en) 1987-09-17 1987-09-17 Electron beam exposure system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62233223A JP2553102B2 (en) 1987-09-17 1987-09-17 Electron beam exposure system

Publications (2)

Publication Number Publication Date
JPS6476660A true JPS6476660A (en) 1989-03-22
JP2553102B2 JP2553102B2 (en) 1996-11-13

Family

ID=16951686

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62233223A Expired - Fee Related JP2553102B2 (en) 1987-09-17 1987-09-17 Electron beam exposure system

Country Status (1)

Country Link
JP (1) JP2553102B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9564293B2 (en) 2013-02-18 2017-02-07 Nuflare Technology, Inc. Charged particle beam writing apparatus, and buffer memory data storage method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7115553B2 (en) 2018-10-10 2022-08-09 株式会社村田製作所 Power generation element mounting boards, battery packs, electronic devices and electric vehicles

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9564293B2 (en) 2013-02-18 2017-02-07 Nuflare Technology, Inc. Charged particle beam writing apparatus, and buffer memory data storage method

Also Published As

Publication number Publication date
JP2553102B2 (en) 1996-11-13

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees