JPS5586155A - Semiconductor device having protective circuit - Google Patents
Semiconductor device having protective circuitInfo
- Publication number
- JPS5586155A JPS5586155A JP15764178A JP15764178A JPS5586155A JP S5586155 A JPS5586155 A JP S5586155A JP 15764178 A JP15764178 A JP 15764178A JP 15764178 A JP15764178 A JP 15764178A JP S5586155 A JPS5586155 A JP S5586155A
- Authority
- JP
- Japan
- Prior art keywords
- electrodes
- charge
- region
- ccd
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
Landscapes
- Solid State Image Pick-Up Elements (AREA)
Abstract
PURPOSE:To increase the reliability of CCD by providing a composite circuit having a pn-junction in the same semiconductor substrate on which a CCD is formed, producing a forward voltage and absorbing the charge here when a false signal charge has generated. CONSTITUTION:p-Type epitaxial layer 12 is grown on n-type semiconductor substrate 11, and n<+>-type regions 13 and n<+>-type region 14, surrounds this, are formed by diffusion in layer 12; and the entire surface is covered with insulating film 15. Next, film 15 on regions 13 and 14 is removed, and on film 15 lying at a distance from this are fitted charge transfer electrodes 18-20. Region 13 is provided with protective electrode 17, and this is connected to any one of electrodes 18-20. When the CCD is three-phase driven, a protective electrode is provided also in region 14 and this is connected to other electrodes 19 and 20. In this structure, a positive voltage is impressed on electrodes 18-20 and charge below the electrodes is transferred. But, when a negative voltage is impressed by some reason or another, a forward voltage is produced in the pn-junction of region 13 and a false charge is absorbed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15764178A JPS5586155A (en) | 1978-12-22 | 1978-12-22 | Semiconductor device having protective circuit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15764178A JPS5586155A (en) | 1978-12-22 | 1978-12-22 | Semiconductor device having protective circuit |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5586155A true JPS5586155A (en) | 1980-06-28 |
Family
ID=15654155
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15764178A Pending JPS5586155A (en) | 1978-12-22 | 1978-12-22 | Semiconductor device having protective circuit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5586155A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4859624A (en) * | 1987-07-31 | 1989-08-22 | Kabushiki Kaisha Toshiba | Manufacturing method of semiconductor device having CCD and peripheral circuit |
-
1978
- 1978-12-22 JP JP15764178A patent/JPS5586155A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4859624A (en) * | 1987-07-31 | 1989-08-22 | Kabushiki Kaisha Toshiba | Manufacturing method of semiconductor device having CCD and peripheral circuit |
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