JPS5587433A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS5587433A
JPS5587433A JP16315278A JP16315278A JPS5587433A JP S5587433 A JPS5587433 A JP S5587433A JP 16315278 A JP16315278 A JP 16315278A JP 16315278 A JP16315278 A JP 16315278A JP S5587433 A JPS5587433 A JP S5587433A
Authority
JP
Japan
Prior art keywords
aperture
edges
deflector
sample
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16315278A
Other languages
English (en)
Other versions
JPS6129137B2 (ja
Inventor
Yasuo Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16315278A priority Critical patent/JPS5587433A/ja
Publication of JPS5587433A publication Critical patent/JPS5587433A/ja
Publication of JPS6129137B2 publication Critical patent/JPS6129137B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP16315278A 1978-12-26 1978-12-26 Electron beam exposure device Granted JPS5587433A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16315278A JPS5587433A (en) 1978-12-26 1978-12-26 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16315278A JPS5587433A (en) 1978-12-26 1978-12-26 Electron beam exposure device

Publications (2)

Publication Number Publication Date
JPS5587433A true JPS5587433A (en) 1980-07-02
JPS6129137B2 JPS6129137B2 (ja) 1986-07-04

Family

ID=15768204

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16315278A Granted JPS5587433A (en) 1978-12-26 1978-12-26 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS5587433A (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5712668A (en) * 1980-06-27 1982-01-22 Nec Corp Printer
JPS5712680A (en) * 1980-06-27 1982-01-22 Nec Corp Printer
JPS5712673A (en) * 1980-06-27 1982-01-22 Nec Corp Serial printer
JPS5762531A (en) * 1980-10-02 1982-04-15 Fujitsu Ltd Exposing device by electron beam
JPS58100427A (ja) * 1981-12-10 1983-06-15 Jeol Ltd 荷電粒子ビ−ム投射方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5712668A (en) * 1980-06-27 1982-01-22 Nec Corp Printer
JPS5712680A (en) * 1980-06-27 1982-01-22 Nec Corp Printer
JPS5712673A (en) * 1980-06-27 1982-01-22 Nec Corp Serial printer
JPS5762531A (en) * 1980-10-02 1982-04-15 Fujitsu Ltd Exposing device by electron beam
JPS58100427A (ja) * 1981-12-10 1983-06-15 Jeol Ltd 荷電粒子ビ−ム投射方法

Also Published As

Publication number Publication date
JPS6129137B2 (ja) 1986-07-04

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