JPS5596768A - Solid image pickup element - Google Patents

Solid image pickup element

Info

Publication number
JPS5596768A
JPS5596768A JP292879A JP292879A JPS5596768A JP S5596768 A JPS5596768 A JP S5596768A JP 292879 A JP292879 A JP 292879A JP 292879 A JP292879 A JP 292879A JP S5596768 A JPS5596768 A JP S5596768A
Authority
JP
Japan
Prior art keywords
film
electrode
image pickup
pickup element
solid image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP292879A
Other languages
Japanese (ja)
Inventor
Kohei Funahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP292879A priority Critical patent/JPS5596768A/en
Publication of JPS5596768A publication Critical patent/JPS5596768A/en
Pending legal-status Critical Current

Links

Landscapes

  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)

Abstract

PURPOSE: To improve the characteristic of a solid image pickup element including a photo sensor, etc., by deposition-forming the electrode group consisting of the superposed layer of a poly-crystal silicon film and a transparent conductive film on the silicon oxide film, which is deposition-formed on a silicon substrate.
CONSTITUTION: In solid image pickup element 41, the first electrode 44 is formed on the first silicon oxide film 43 deposition-formed on one main face of silicon substrate 42, and the second silicon oxide film 45 is so formed that the upper face and the side face of electrode 44 may be covered with film 45, and the second electrode 46 is so interposed that film 45 may be interposed and electrode 46 may be caused to deposit to film 43 and be extended onto electrode 44. Then, the first poly-crystal silicon films 441 and 461 and mixture layers 442 and 462 of transparent conductive films such as In2O3 are formed together with electrodes 44 and 46, and the second poly-crystal silicon films 443 and 463 are formed on them.
COPYRIGHT: (C)1980,JPO&Japio
JP292879A 1979-01-17 1979-01-17 Solid image pickup element Pending JPS5596768A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP292879A JPS5596768A (en) 1979-01-17 1979-01-17 Solid image pickup element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP292879A JPS5596768A (en) 1979-01-17 1979-01-17 Solid image pickup element

Publications (1)

Publication Number Publication Date
JPS5596768A true JPS5596768A (en) 1980-07-23

Family

ID=11542996

Family Applications (1)

Application Number Title Priority Date Filing Date
JP292879A Pending JPS5596768A (en) 1979-01-17 1979-01-17 Solid image pickup element

Country Status (1)

Country Link
JP (1) JPS5596768A (en)

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