JPS56150703A - Direction-selective light shielding or reflecting sheet and its production - Google Patents

Direction-selective light shielding or reflecting sheet and its production

Info

Publication number
JPS56150703A
JPS56150703A JP5389080A JP5389080A JPS56150703A JP S56150703 A JPS56150703 A JP S56150703A JP 5389080 A JP5389080 A JP 5389080A JP 5389080 A JP5389080 A JP 5389080A JP S56150703 A JPS56150703 A JP S56150703A
Authority
JP
Japan
Prior art keywords
layer
light shielding
negative
light
respect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5389080A
Other languages
Japanese (ja)
Inventor
Makoto Honda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP5389080A priority Critical patent/JPS56150703A/en
Publication of JPS56150703A publication Critical patent/JPS56150703A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

PURPOSE:To form a sheet which differs in transmittance with respect to the incident angle of light by providing the light shielding patterns of roughly the same shape in the relative positions of negative and positive on both surfaces of a light transmittable substrate. CONSTITUTION:The 1st light shielding layer 3 is provided on one surface of a transparent substrate 2 in a pattern shape, whilist a layer 61 of a positve type photosensitive resin (for example, the one of azide rubber type) is provided over the entire surface on the other side, thence it is exposed and developed from the layer 3 side to form a photosensitive resin layer 7 having the patterns in the relation of negative and negative with respect to the layer 3; thereafter, the layer of a light shielding material 8 is provided over the entire surface thereon. Next, the layer 7 is removed together with the material 8 thereon by a reverse etching method to form the 2nd light shielding layer 4 of the pattern shape in the relation of negative and positive with respect to the layer 3, whereby the light shielding sheet of which the transmittance changes in about 0-50% range with the incident angles of light is obtained. If reflection layers 13, 14 are used in place of said layers 3, 4, the reflection sheet of which the reflectivity changes in about 50-100% range is obtained.
JP5389080A 1980-04-23 1980-04-23 Direction-selective light shielding or reflecting sheet and its production Pending JPS56150703A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5389080A JPS56150703A (en) 1980-04-23 1980-04-23 Direction-selective light shielding or reflecting sheet and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5389080A JPS56150703A (en) 1980-04-23 1980-04-23 Direction-selective light shielding or reflecting sheet and its production

Publications (1)

Publication Number Publication Date
JPS56150703A true JPS56150703A (en) 1981-11-21

Family

ID=12955314

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5389080A Pending JPS56150703A (en) 1980-04-23 1980-04-23 Direction-selective light shielding or reflecting sheet and its production

Country Status (1)

Country Link
JP (1) JPS56150703A (en)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60211402A (en) * 1984-04-04 1985-10-23 Tokai Rika Co Ltd Light direction limiting plate
JPS6193503A (en) * 1984-07-28 1986-05-12 コントラ ヴイジヨン リミテツド Panel
JPS61100701A (en) * 1984-10-24 1986-05-19 Arisawa Seisakusho:Kk Light beam direction control plate
JPS61294402A (en) * 1985-06-21 1986-12-25 Dainippon Printing Co Ltd blackout filter
JPS6411288U (en) * 1987-07-13 1989-01-20
WO1993025792A1 (en) * 1992-06-17 1993-12-23 Figla Co., Ltd. Light transmittable members, and method of adjusting natural lighting quantity and natural lighting range by use of the light transmittable members
JPH06242305A (en) * 1984-07-28 1994-09-02 Contra Vision Ltd Panel
EP0706088A1 (en) * 1990-05-09 1996-04-10 Canon Kabushiki Kaisha Photomask for use in etching patterns
JP2009541812A (en) * 2007-04-06 2009-11-26 エルジー・ケム・リミテッド Display device filter
JP2009545002A (en) * 2007-03-30 2009-12-17 エルジー・ケム・リミテッド Method for producing film on which micropattern is formed and film produced thereby
WO2014147884A1 (en) * 2013-03-21 2014-09-25 株式会社 東芝 Blind member and window material provided with blind member
JP2016038439A (en) * 2014-08-06 2016-03-22 株式会社東芝 Optical control member
JP2020533596A (en) * 2017-09-13 2020-11-19 マテリオン コーポレイション Photoresist as an opaque aperture mask on a multispectral filter array
US11131934B2 (en) 2019-10-29 2021-09-28 Waymo Llc Non-telecentric light guide elements
US11131929B2 (en) * 2018-11-07 2021-09-28 Waymo Llc Systems and methods that utilize angled photolithography for manufacturing light guide elements

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60211402A (en) * 1984-04-04 1985-10-23 Tokai Rika Co Ltd Light direction limiting plate
JPS6193503A (en) * 1984-07-28 1986-05-12 コントラ ヴイジヨン リミテツド Panel
JPH06242305A (en) * 1984-07-28 1994-09-02 Contra Vision Ltd Panel
JPS61100701A (en) * 1984-10-24 1986-05-19 Arisawa Seisakusho:Kk Light beam direction control plate
JPS61294402A (en) * 1985-06-21 1986-12-25 Dainippon Printing Co Ltd blackout filter
JPS6411288U (en) * 1987-07-13 1989-01-20
EP0706088A1 (en) * 1990-05-09 1996-04-10 Canon Kabushiki Kaisha Photomask for use in etching patterns
WO1993025792A1 (en) * 1992-06-17 1993-12-23 Figla Co., Ltd. Light transmittable members, and method of adjusting natural lighting quantity and natural lighting range by use of the light transmittable members
EP0601202A4 (en) * 1992-06-17 1995-07-05 Figla Co Ltd ELEMENTS THAT CAN TRANSMIT LIGHT, AND A METHOD FOR ADJUSTING THE QUANTITY AND THE RANGE OF NATURAL LIGHTING USING THE SAME.
JP2009545002A (en) * 2007-03-30 2009-12-17 エルジー・ケム・リミテッド Method for producing film on which micropattern is formed and film produced thereby
JP2009541812A (en) * 2007-04-06 2009-11-26 エルジー・ケム・リミテッド Display device filter
JP2014185424A (en) * 2013-03-21 2014-10-02 Toshiba Corp Blind member and window member having blind member
WO2014147884A1 (en) * 2013-03-21 2014-09-25 株式会社 東芝 Blind member and window material provided with blind member
JP2016038439A (en) * 2014-08-06 2016-03-22 株式会社東芝 Optical control member
JP2020533596A (en) * 2017-09-13 2020-11-19 マテリオン コーポレイション Photoresist as an opaque aperture mask on a multispectral filter array
JP2023068012A (en) * 2017-09-13 2023-05-16 マテリオン コーポレイション Photoresist as an opaque aperture mask on multispectral filter arrays
US11762137B2 (en) 2017-09-13 2023-09-19 Materion Corporation Photo resist as opaque aperture mask on multispectral filter arrays
US12345903B2 (en) 2017-09-13 2025-07-01 Materion Corporation Photo resist as opaque aperture mask on multispectral filter arrays
US11131929B2 (en) * 2018-11-07 2021-09-28 Waymo Llc Systems and methods that utilize angled photolithography for manufacturing light guide elements
US11994802B2 (en) 2018-11-07 2024-05-28 Waymo Llc Systems and methods that utilize angled photolithography for manufacturing light guide elements
US11131934B2 (en) 2019-10-29 2021-09-28 Waymo Llc Non-telecentric light guide elements
US11520236B2 (en) 2019-10-29 2022-12-06 Waymo Llc Non-telecentric light guide elements
US11868050B2 (en) 2019-10-29 2024-01-09 Waymo Llc Non-telecentric light guide elements
US12174547B2 (en) 2019-10-29 2024-12-24 Waymo Llc Non-telecentric light guide elements

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