JPS56150703A - Direction-selective light shielding or reflecting sheet and its production - Google Patents
Direction-selective light shielding or reflecting sheet and its productionInfo
- Publication number
- JPS56150703A JPS56150703A JP5389080A JP5389080A JPS56150703A JP S56150703 A JPS56150703 A JP S56150703A JP 5389080 A JP5389080 A JP 5389080A JP 5389080 A JP5389080 A JP 5389080A JP S56150703 A JPS56150703 A JP S56150703A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- light shielding
- negative
- light
- respect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 2
- 229920005989 resin Polymers 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 238000002834 transmittance Methods 0.000 abstract 2
- 150000001540 azides Chemical class 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000002310 reflectometry Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
PURPOSE:To form a sheet which differs in transmittance with respect to the incident angle of light by providing the light shielding patterns of roughly the same shape in the relative positions of negative and positive on both surfaces of a light transmittable substrate. CONSTITUTION:The 1st light shielding layer 3 is provided on one surface of a transparent substrate 2 in a pattern shape, whilist a layer 61 of a positve type photosensitive resin (for example, the one of azide rubber type) is provided over the entire surface on the other side, thence it is exposed and developed from the layer 3 side to form a photosensitive resin layer 7 having the patterns in the relation of negative and negative with respect to the layer 3; thereafter, the layer of a light shielding material 8 is provided over the entire surface thereon. Next, the layer 7 is removed together with the material 8 thereon by a reverse etching method to form the 2nd light shielding layer 4 of the pattern shape in the relation of negative and positive with respect to the layer 3, whereby the light shielding sheet of which the transmittance changes in about 0-50% range with the incident angles of light is obtained. If reflection layers 13, 14 are used in place of said layers 3, 4, the reflection sheet of which the reflectivity changes in about 50-100% range is obtained.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5389080A JPS56150703A (en) | 1980-04-23 | 1980-04-23 | Direction-selective light shielding or reflecting sheet and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5389080A JPS56150703A (en) | 1980-04-23 | 1980-04-23 | Direction-selective light shielding or reflecting sheet and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS56150703A true JPS56150703A (en) | 1981-11-21 |
Family
ID=12955314
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5389080A Pending JPS56150703A (en) | 1980-04-23 | 1980-04-23 | Direction-selective light shielding or reflecting sheet and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56150703A (en) |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60211402A (en) * | 1984-04-04 | 1985-10-23 | Tokai Rika Co Ltd | Light direction limiting plate |
| JPS6193503A (en) * | 1984-07-28 | 1986-05-12 | コントラ ヴイジヨン リミテツド | Panel |
| JPS61100701A (en) * | 1984-10-24 | 1986-05-19 | Arisawa Seisakusho:Kk | Light beam direction control plate |
| JPS61294402A (en) * | 1985-06-21 | 1986-12-25 | Dainippon Printing Co Ltd | blackout filter |
| JPS6411288U (en) * | 1987-07-13 | 1989-01-20 | ||
| WO1993025792A1 (en) * | 1992-06-17 | 1993-12-23 | Figla Co., Ltd. | Light transmittable members, and method of adjusting natural lighting quantity and natural lighting range by use of the light transmittable members |
| JPH06242305A (en) * | 1984-07-28 | 1994-09-02 | Contra Vision Ltd | Panel |
| EP0706088A1 (en) * | 1990-05-09 | 1996-04-10 | Canon Kabushiki Kaisha | Photomask for use in etching patterns |
| JP2009541812A (en) * | 2007-04-06 | 2009-11-26 | エルジー・ケム・リミテッド | Display device filter |
| JP2009545002A (en) * | 2007-03-30 | 2009-12-17 | エルジー・ケム・リミテッド | Method for producing film on which micropattern is formed and film produced thereby |
| WO2014147884A1 (en) * | 2013-03-21 | 2014-09-25 | 株式会社 東芝 | Blind member and window material provided with blind member |
| JP2016038439A (en) * | 2014-08-06 | 2016-03-22 | 株式会社東芝 | Optical control member |
| JP2020533596A (en) * | 2017-09-13 | 2020-11-19 | マテリオン コーポレイション | Photoresist as an opaque aperture mask on a multispectral filter array |
| US11131934B2 (en) | 2019-10-29 | 2021-09-28 | Waymo Llc | Non-telecentric light guide elements |
| US11131929B2 (en) * | 2018-11-07 | 2021-09-28 | Waymo Llc | Systems and methods that utilize angled photolithography for manufacturing light guide elements |
-
1980
- 1980-04-23 JP JP5389080A patent/JPS56150703A/en active Pending
Cited By (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60211402A (en) * | 1984-04-04 | 1985-10-23 | Tokai Rika Co Ltd | Light direction limiting plate |
| JPS6193503A (en) * | 1984-07-28 | 1986-05-12 | コントラ ヴイジヨン リミテツド | Panel |
| JPH06242305A (en) * | 1984-07-28 | 1994-09-02 | Contra Vision Ltd | Panel |
| JPS61100701A (en) * | 1984-10-24 | 1986-05-19 | Arisawa Seisakusho:Kk | Light beam direction control plate |
| JPS61294402A (en) * | 1985-06-21 | 1986-12-25 | Dainippon Printing Co Ltd | blackout filter |
| JPS6411288U (en) * | 1987-07-13 | 1989-01-20 | ||
| EP0706088A1 (en) * | 1990-05-09 | 1996-04-10 | Canon Kabushiki Kaisha | Photomask for use in etching patterns |
| WO1993025792A1 (en) * | 1992-06-17 | 1993-12-23 | Figla Co., Ltd. | Light transmittable members, and method of adjusting natural lighting quantity and natural lighting range by use of the light transmittable members |
| EP0601202A4 (en) * | 1992-06-17 | 1995-07-05 | Figla Co Ltd | ELEMENTS THAT CAN TRANSMIT LIGHT, AND A METHOD FOR ADJUSTING THE QUANTITY AND THE RANGE OF NATURAL LIGHTING USING THE SAME. |
| JP2009545002A (en) * | 2007-03-30 | 2009-12-17 | エルジー・ケム・リミテッド | Method for producing film on which micropattern is formed and film produced thereby |
| JP2009541812A (en) * | 2007-04-06 | 2009-11-26 | エルジー・ケム・リミテッド | Display device filter |
| JP2014185424A (en) * | 2013-03-21 | 2014-10-02 | Toshiba Corp | Blind member and window member having blind member |
| WO2014147884A1 (en) * | 2013-03-21 | 2014-09-25 | 株式会社 東芝 | Blind member and window material provided with blind member |
| JP2016038439A (en) * | 2014-08-06 | 2016-03-22 | 株式会社東芝 | Optical control member |
| JP2020533596A (en) * | 2017-09-13 | 2020-11-19 | マテリオン コーポレイション | Photoresist as an opaque aperture mask on a multispectral filter array |
| JP2023068012A (en) * | 2017-09-13 | 2023-05-16 | マテリオン コーポレイション | Photoresist as an opaque aperture mask on multispectral filter arrays |
| US11762137B2 (en) | 2017-09-13 | 2023-09-19 | Materion Corporation | Photo resist as opaque aperture mask on multispectral filter arrays |
| US12345903B2 (en) | 2017-09-13 | 2025-07-01 | Materion Corporation | Photo resist as opaque aperture mask on multispectral filter arrays |
| US11131929B2 (en) * | 2018-11-07 | 2021-09-28 | Waymo Llc | Systems and methods that utilize angled photolithography for manufacturing light guide elements |
| US11994802B2 (en) | 2018-11-07 | 2024-05-28 | Waymo Llc | Systems and methods that utilize angled photolithography for manufacturing light guide elements |
| US11131934B2 (en) | 2019-10-29 | 2021-09-28 | Waymo Llc | Non-telecentric light guide elements |
| US11520236B2 (en) | 2019-10-29 | 2022-12-06 | Waymo Llc | Non-telecentric light guide elements |
| US11868050B2 (en) | 2019-10-29 | 2024-01-09 | Waymo Llc | Non-telecentric light guide elements |
| US12174547B2 (en) | 2019-10-29 | 2024-12-24 | Waymo Llc | Non-telecentric light guide elements |
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