JPS5620552A - Novel basic compound and its preparation - Google Patents
Novel basic compound and its preparationInfo
- Publication number
- JPS5620552A JPS5620552A JP9666579A JP9666579A JPS5620552A JP S5620552 A JPS5620552 A JP S5620552A JP 9666579 A JP9666579 A JP 9666579A JP 9666579 A JP9666579 A JP 9666579A JP S5620552 A JPS5620552 A JP S5620552A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- compound shown
- basic compound
- preparation
- styrene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000007514 bases Chemical class 0.000 title abstract 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract 3
- -1 diethylenetriamine Chemical class 0.000 abstract 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 2
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 abstract 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 abstract 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 abstract 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 abstract 1
- 229910052783 alkali metal Inorganic materials 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 150000001412 amines Chemical class 0.000 abstract 1
- 230000003197 catalytic effect Effects 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 239000003822 epoxy resin Substances 0.000 abstract 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- AFRJJFRNGGLMDW-UHFFFAOYSA-N lithium amide Chemical compound [Li+].[NH2-] AFRJJFRNGGLMDW-UHFFFAOYSA-N 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 abstract 1
- 239000003960 organic solvent Substances 0.000 abstract 1
- 229920000647 polyepoxide Polymers 0.000 abstract 1
- 150000003440 styrenes Chemical class 0.000 abstract 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Abstract
NEW MATERIAL:A basic compound shown by the formula I (X is H, 1W4C alkyl, halogen, and nitro; m and n are 1W4).
EXAMPLE: 1,8-Diamino-N3-[2-(para-n-butyl)ethyl]-3,6-diaza-n-octane.
USE: A curing agent for an epoxy resin, etc.
PROCESS: An amine (e.g., diethylenetriamine, etc.) shown by the formula II is reacted with a substituted styrene (e.g., styrene, chlorostyrene, etc.) in the presence of an alkali metal amide (e.g., lithium amide, etc.) to give a compound shown by the formula I. The reaction is carried out by using an inert organic solvent (e.g., hexane, cyclohexane, tetrahydrofurane, etc.). A compound shown by the formula III has catalytic action and its concentration influences the reaction rate.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9666579A JPS5620552A (en) | 1979-07-31 | 1979-07-31 | Novel basic compound and its preparation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9666579A JPS5620552A (en) | 1979-07-31 | 1979-07-31 | Novel basic compound and its preparation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5620552A true JPS5620552A (en) | 1981-02-26 |
| JPS636540B2 JPS636540B2 (en) | 1988-02-10 |
Family
ID=14171102
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9666579A Granted JPS5620552A (en) | 1979-07-31 | 1979-07-31 | Novel basic compound and its preparation |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5620552A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002161076A (en) * | 2000-09-12 | 2002-06-04 | Mitsubishi Gas Chem Co Inc | Amino compound and method for producing the same |
| JP2005089455A (en) * | 2003-08-13 | 2005-04-07 | Mitsubishi Gas Chem Co Inc | Method for producing amino composition |
-
1979
- 1979-07-31 JP JP9666579A patent/JPS5620552A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002161076A (en) * | 2000-09-12 | 2002-06-04 | Mitsubishi Gas Chem Co Inc | Amino compound and method for producing the same |
| JP2005089455A (en) * | 2003-08-13 | 2005-04-07 | Mitsubishi Gas Chem Co Inc | Method for producing amino composition |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS636540B2 (en) | 1988-02-10 |
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