JPS5640828A - Production of photomask - Google Patents

Production of photomask

Info

Publication number
JPS5640828A
JPS5640828A JP11769579A JP11769579A JPS5640828A JP S5640828 A JPS5640828 A JP S5640828A JP 11769579 A JP11769579 A JP 11769579A JP 11769579 A JP11769579 A JP 11769579A JP S5640828 A JPS5640828 A JP S5640828A
Authority
JP
Japan
Prior art keywords
film
patterns
thence
metal
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11769579A
Other languages
Japanese (ja)
Inventor
Kazuhiro Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP11769579A priority Critical patent/JPS5640828A/en
Publication of JPS5640828A publication Critical patent/JPS5640828A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To improve conductivity and hardness and prevent the metal film from being broken by forming a transparent conductive film and opaque metal film successively on a transparent substrate then forming patterns on the metal thin film by photoetching techniques thence annealing the same after implantation of ions. CONSTITUTION:A transparent conductive film 2 of SnO2, a metal Cr thin film 3 and a chromium oxide film 4 are formed on a glass substrate 1. Thence, photoresist is coated on the film 4, after which it is contact printed by using a master mask and is then developed, whereby resist patterns 5 are formed. Next, with the patterns 5 as a mask, the films 3, 4 are selectively etched away to form predetermined patterns, after which the film 5 is peeled. Thence, antimony ions 6a are implanted to form an ion implanted layer 6 on the film 2. Finally, the thus obtained plate is heated to about 350 deg.C whereby it is annealed. In this way, the optical and electrical characteristics of the conductive film 2 are improved. In addition, the Cr film 3 becomes harder, so that the patterned Cr film 3 is prevented from being broken by the charge which is accumulated in the mask during the use then discharged.
JP11769579A 1979-09-11 1979-09-11 Production of photomask Pending JPS5640828A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11769579A JPS5640828A (en) 1979-09-11 1979-09-11 Production of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11769579A JPS5640828A (en) 1979-09-11 1979-09-11 Production of photomask

Publications (1)

Publication Number Publication Date
JPS5640828A true JPS5640828A (en) 1981-04-17

Family

ID=14718003

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11769579A Pending JPS5640828A (en) 1979-09-11 1979-09-11 Production of photomask

Country Status (1)

Country Link
JP (1) JPS5640828A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4411972A (en) * 1981-12-30 1983-10-25 International Business Machines Corporation Integrated circuit photomask
US4670365A (en) * 1984-10-29 1987-06-02 Nec Corporation Photomask and method of fabrication thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4411972A (en) * 1981-12-30 1983-10-25 International Business Machines Corporation Integrated circuit photomask
US4670365A (en) * 1984-10-29 1987-06-02 Nec Corporation Photomask and method of fabrication thereof

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