JPS5641375A - Sputtering apparatus - Google Patents

Sputtering apparatus

Info

Publication number
JPS5641375A
JPS5641375A JP11851779A JP11851779A JPS5641375A JP S5641375 A JPS5641375 A JP S5641375A JP 11851779 A JP11851779 A JP 11851779A JP 11851779 A JP11851779 A JP 11851779A JP S5641375 A JPS5641375 A JP S5641375A
Authority
JP
Japan
Prior art keywords
anode
sputtering apparatus
coating
columnar
globular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11851779A
Other languages
Japanese (ja)
Inventor
Fumio Hosomi
Masazumi Katase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP11851779A priority Critical patent/JPS5641375A/en
Publication of JPS5641375A publication Critical patent/JPS5641375A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/223—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating specially adapted for coating particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To make the coating formation on the columnar or globular material possible, by providing the apparatus giving oscillation or revolution to the electrode having the material which forms the coating, in sputtering apparatus. CONSTITUTION:Uniform coating is formed on curved surface of matrial having not only cylindrical shape but columnar or globular etc. shape. For example, the cathode 7 having the target substance 8 and the anode 9 having the material 10, are provided in the chamber 15. Surface of the anode 9 is surround by the convex part 9a and the material 10 is kept not to fallen down and the anode 9 is connected with the motor 12 through the cum 14 and the rotating shaft 13. Oscillation is given to the anode 9 by the motor 12 at the time of applying the direct current power source 11 and operating the sputtering apparatus. Hereby, the material 10 is moved at random and uniform coating is formed on the surface of the material 10 because of turning all face toward the substance 8.
JP11851779A 1979-09-13 1979-09-13 Sputtering apparatus Pending JPS5641375A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11851779A JPS5641375A (en) 1979-09-13 1979-09-13 Sputtering apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11851779A JPS5641375A (en) 1979-09-13 1979-09-13 Sputtering apparatus

Publications (1)

Publication Number Publication Date
JPS5641375A true JPS5641375A (en) 1981-04-18

Family

ID=14738578

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11851779A Pending JPS5641375A (en) 1979-09-13 1979-09-13 Sputtering apparatus

Country Status (1)

Country Link
JP (1) JPS5641375A (en)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58136701A (en) * 1982-02-08 1983-08-13 Japan Synthetic Rubber Co Ltd Coating method for fine particles
JPS59120531U (en) * 1983-02-01 1984-08-14 トヨタ自動車株式会社 Nut automatic tightening device
JPS604008A (en) * 1983-06-23 1985-01-10 アサノ精機株式会社 Formwork bolt erecting device
JPS605805U (en) * 1983-06-23 1985-01-16 アサノ精機株式会社 Bolt raising device with oil spray mechanism
JPS60104622A (en) * 1983-06-20 1985-06-10 Shibaura Eng Works Co Ltd Mobile bolt tightening device
JPS63194903A (en) * 1987-02-09 1988-08-12 生川コンクリ−ト株式会社 Automatic clamping method and device for formwork for molding concrete product
JPS63194902A (en) * 1987-02-09 1988-08-12 生川コンクリ−ト株式会社 Automatic loosening device for formwork for molding concrete product
JPH0726379A (en) * 1993-07-09 1995-01-27 Koa Corp Method for formation of thin film and device therefor
WO2004059031A1 (en) * 2002-12-25 2004-07-15 Youtec Co.,Ltd. Polygonal barrel spattering device, polygonal barrel spattering method, coated particle formed by the device and method, microcapsule, and method of manufacturing the microcapsule
JP2008045197A (en) * 2006-08-21 2008-02-28 Sony Corp Composite powder manufacturing method and composite powder manufacturing apparatus
WO2008119514A1 (en) * 2007-03-29 2008-10-09 Hauzer Techno Coating Bv Method and device for coating particularly rounded objects by means of a pvd and/or cvd or pacvd method in a vacuum system
US8268080B2 (en) 2008-03-25 2012-09-18 Sony Corporation Apparatus and method for preparing composite particulates using vapor deposition
JP2016122750A (en) * 2014-12-25 2016-07-07 株式会社島津製作所 Work holder and film forming apparatus
WO2016140326A1 (en) * 2015-03-04 2016-09-09 デクセリアルズ株式会社 Method for manufacturing conductive particles, anisotropically conductive adhesive, and method for mounting component
CN112555112A (en) * 2020-11-06 2021-03-26 兰州空间技术物理研究所 Textured special-shaped structure anode on inner surface of ion thruster based on 3D additive manufacturing

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS515279A (en) * 1974-05-28 1976-01-16 Corning Glass Works Fukusunoenchukeibutsutaioitsuseinihifukusuruhohooyobi kaitensupatsutasochi
JPS5154844A (en) * 1974-05-08 1976-05-14 Hokuriku Elect Ind Kinzokuhakumakuno seizosochi
JPS52123362A (en) * 1976-04-09 1977-10-17 Hokuriku Elect Ind Device for making thin metal film

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5154844A (en) * 1974-05-08 1976-05-14 Hokuriku Elect Ind Kinzokuhakumakuno seizosochi
JPS515279A (en) * 1974-05-28 1976-01-16 Corning Glass Works Fukusunoenchukeibutsutaioitsuseinihifukusuruhohooyobi kaitensupatsutasochi
JPS52123362A (en) * 1976-04-09 1977-10-17 Hokuriku Elect Ind Device for making thin metal film

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58136701A (en) * 1982-02-08 1983-08-13 Japan Synthetic Rubber Co Ltd Coating method for fine particles
JPS59120531U (en) * 1983-02-01 1984-08-14 トヨタ自動車株式会社 Nut automatic tightening device
JPS60104622A (en) * 1983-06-20 1985-06-10 Shibaura Eng Works Co Ltd Mobile bolt tightening device
JPS604008A (en) * 1983-06-23 1985-01-10 アサノ精機株式会社 Formwork bolt erecting device
JPS605805U (en) * 1983-06-23 1985-01-16 アサノ精機株式会社 Bolt raising device with oil spray mechanism
JPS63194903A (en) * 1987-02-09 1988-08-12 生川コンクリ−ト株式会社 Automatic clamping method and device for formwork for molding concrete product
JPS63194902A (en) * 1987-02-09 1988-08-12 生川コンクリ−ト株式会社 Automatic loosening device for formwork for molding concrete product
JPH0726379A (en) * 1993-07-09 1995-01-27 Koa Corp Method for formation of thin film and device therefor
WO2004059031A1 (en) * 2002-12-25 2004-07-15 Youtec Co.,Ltd. Polygonal barrel spattering device, polygonal barrel spattering method, coated particle formed by the device and method, microcapsule, and method of manufacturing the microcapsule
JP2008045197A (en) * 2006-08-21 2008-02-28 Sony Corp Composite powder manufacturing method and composite powder manufacturing apparatus
WO2008119514A1 (en) * 2007-03-29 2008-10-09 Hauzer Techno Coating Bv Method and device for coating particularly rounded objects by means of a pvd and/or cvd or pacvd method in a vacuum system
US8268080B2 (en) 2008-03-25 2012-09-18 Sony Corporation Apparatus and method for preparing composite particulates using vapor deposition
US8545934B2 (en) 2008-03-25 2013-10-01 Sony Corporation Apparatus and method for preparing composite particulates
JP2016122750A (en) * 2014-12-25 2016-07-07 株式会社島津製作所 Work holder and film forming apparatus
WO2016140326A1 (en) * 2015-03-04 2016-09-09 デクセリアルズ株式会社 Method for manufacturing conductive particles, anisotropically conductive adhesive, and method for mounting component
CN112555112A (en) * 2020-11-06 2021-03-26 兰州空间技术物理研究所 Textured special-shaped structure anode on inner surface of ion thruster based on 3D additive manufacturing
CN112555112B (en) * 2020-11-06 2022-06-14 兰州空间技术物理研究所 Textured special-shaped structure anode on inner surface of ion thruster based on 3D additive manufacturing

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