JPS5644037A - Microwave plasma fine particle treating apparatus - Google Patents
Microwave plasma fine particle treating apparatusInfo
- Publication number
- JPS5644037A JPS5644037A JP11923779A JP11923779A JPS5644037A JP S5644037 A JPS5644037 A JP S5644037A JP 11923779 A JP11923779 A JP 11923779A JP 11923779 A JP11923779 A JP 11923779A JP S5644037 A JPS5644037 A JP S5644037A
- Authority
- JP
- Japan
- Prior art keywords
- fine particles
- plasma
- vessel
- antenna
- treated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010419 fine particle Substances 0.000 title abstract 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
- 238000007599 discharging Methods 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 239000010453 quartz Substances 0.000 abstract 1
- 238000011084 recovery Methods 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
- 238000010186 staining Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
PURPOSE:To make the recovery of the treated fine particles extremely easy at the time of performing treatment of the fine particles with the plasma by microwave dischraging by introducing an antenna for microwaves into a hermetic vessel containing the fine particles by way of a cylindrical body. CONSTITUTION:A heat-resistant fine particle containing vessel 16 made of quartiz, alumina or the like is disposed in a plasma forming chamber 5 of hermetic type made of metals, and the fine particles 17 to be treated are put therein. A cylindrical body 22 made of quartz is also placed in the central part of the vessle 16 and an antenna 21 made of copper or the like is disposed therein. The inside of the plasma forming chamber 5 is evacuated to about 1X10<-5>torr by an exhauster 8 and the plasma forming gas in a bomb 12 is admitted therein. Next, microwaves of 10<9>- 10<12>Hz are generated with a microwave generator 1 and are led to the antenna 21 so that plasma is produced by discharging. The fine particles 17 are treated with this plasma and thaken out from the vessel 16 without staining the hermetic vessel 16.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11923779A JPS5644037A (en) | 1979-09-19 | 1979-09-19 | Microwave plasma fine particle treating apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11923779A JPS5644037A (en) | 1979-09-19 | 1979-09-19 | Microwave plasma fine particle treating apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5644037A true JPS5644037A (en) | 1981-04-23 |
Family
ID=14756351
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11923779A Pending JPS5644037A (en) | 1979-09-19 | 1979-09-19 | Microwave plasma fine particle treating apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5644037A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59177931A (en) * | 1983-03-28 | 1984-10-08 | Fujitsu Ltd | Microwave processor |
| CN100361918C (en) * | 2006-01-10 | 2008-01-16 | 中国铝业股份有限公司 | A kind of hydraulic alumina castable binder and preparation method thereof |
-
1979
- 1979-09-19 JP JP11923779A patent/JPS5644037A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59177931A (en) * | 1983-03-28 | 1984-10-08 | Fujitsu Ltd | Microwave processor |
| CN100361918C (en) * | 2006-01-10 | 2008-01-16 | 中国铝业股份有限公司 | A kind of hydraulic alumina castable binder and preparation method thereof |
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