JPS566469A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS566469A JPS566469A JP8072879A JP8072879A JPS566469A JP S566469 A JPS566469 A JP S566469A JP 8072879 A JP8072879 A JP 8072879A JP 8072879 A JP8072879 A JP 8072879A JP S566469 A JPS566469 A JP S566469A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- low density
- type
- layers
- density layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 230000006866 deterioration Effects 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/30—Devices controlled by electric currents or voltages
- H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H10D48/34—Bipolar devices
- H10D48/345—Bipolar transistors having ohmic electrodes on emitter-like, base-like, and collector-like regions
Landscapes
- Bipolar Transistors (AREA)
Abstract
PURPOSE:To prevent deterioration of the withstand voltage of a semiconductor device by forming insulating layers on both main surfaces of a first conducting type semiconductor substrate made of high and low density layers, exposing the main surfaces of the low density layer side and diffusing selectively the second conducting type substance in the low density layer. CONSTITUTION:N-type high density layers 1', 1'' are formed on an N-type low density layer 11', and one high density layer 1'' is removed therefrom. Then, the first insulating layer 2, 2' are formed, and the first insulating layer 2 and the surface portion 11' are removed from the low density layer 1 side. Thereafter, the second insulating layers 12 is coated thereon, and an opening 14 for diffusing the base region is formed on the layer 12. Subsequently, a P-type conducting impurity is diffused through the opening 14 to form a base region 15. Then, an emitter region 16 is formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8072879A JPS566469A (en) | 1979-06-28 | 1979-06-28 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8072879A JPS566469A (en) | 1979-06-28 | 1979-06-28 | Manufacture of semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS566469A true JPS566469A (en) | 1981-01-23 |
Family
ID=13726423
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8072879A Pending JPS566469A (en) | 1979-06-28 | 1979-06-28 | Manufacture of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS566469A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS629624A (en) * | 1985-07-08 | 1987-01-17 | Rohm Co Ltd | Manufacture of semiconductor device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5123073A (en) * | 1974-08-21 | 1976-02-24 | Hitachi Ltd | Handotaisochino seizoho |
| JPS54128291A (en) * | 1978-03-29 | 1979-10-04 | Hitachi Ltd | Manufacture of semiconductor device |
-
1979
- 1979-06-28 JP JP8072879A patent/JPS566469A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5123073A (en) * | 1974-08-21 | 1976-02-24 | Hitachi Ltd | Handotaisochino seizoho |
| JPS54128291A (en) * | 1978-03-29 | 1979-10-04 | Hitachi Ltd | Manufacture of semiconductor device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS629624A (en) * | 1985-07-08 | 1987-01-17 | Rohm Co Ltd | Manufacture of semiconductor device |
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