JPS567432A - Controlling method for low pressure of vacuum apparatus - Google Patents
Controlling method for low pressure of vacuum apparatusInfo
- Publication number
- JPS567432A JPS567432A JP8205379A JP8205379A JPS567432A JP S567432 A JPS567432 A JP S567432A JP 8205379 A JP8205379 A JP 8205379A JP 8205379 A JP8205379 A JP 8205379A JP S567432 A JPS567432 A JP S567432A
- Authority
- JP
- Japan
- Prior art keywords
- base body
- pressure
- vacuum vessel
- anode
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
Landscapes
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE:To return the pressure in a vacuum vessel to fixed pressure rapidly even when the pressure alters by a method wherein the number of revolution of vacuum pumps is changed in response to the variation of the discharging impedance of a spatter electrode or an etching electrode of the vacuum vessel. CONSTITUTION:A vacuum vessel 11 is provided with an introducing pip 12 to which a variable leaking valve for introducing etching gas is attached, and vacuum pumps 13, 14 for exhausting the gas are fitted. A base body 20 on which a pattern is placed and an anode 21 are attached into the vacuum vessel 11, the base body 20 is connected to a DC power source 22 or an AC power source 23, and the anode 21 is grounded. Meanwhile, a detector 24 is fitted between the base body 20 and the ground, and a varying portion of discharging impedance between the anode 21 and the base body 20 is detected by means of the detector 24. The detecting output is given to a comparator 25 in which the reference voltage is previously set, and the difference is amplified 27 and forwarded to a motor 28 of the pump 13 to control the number of revolution of the motor. Thus, pressure in the vessel 11 is kept constant within the desired range, and uniform etching is enabled at all times.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8205379A JPS567432A (en) | 1979-06-30 | 1979-06-30 | Controlling method for low pressure of vacuum apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8205379A JPS567432A (en) | 1979-06-30 | 1979-06-30 | Controlling method for low pressure of vacuum apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS567432A true JPS567432A (en) | 1981-01-26 |
Family
ID=13763762
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8205379A Pending JPS567432A (en) | 1979-06-30 | 1979-06-30 | Controlling method for low pressure of vacuum apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS567432A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6143426A (en) * | 1984-08-08 | 1986-03-03 | Ulvac Corp | Pressure controlling device for vacuum processing device |
| US4949670A (en) * | 1988-11-04 | 1990-08-21 | Tegal Corporation | Method and apparatus for low pressure plasma |
| US5415718A (en) * | 1990-09-21 | 1995-05-16 | Tadahiro Ohmi | Reactive ion etching device |
-
1979
- 1979-06-30 JP JP8205379A patent/JPS567432A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6143426A (en) * | 1984-08-08 | 1986-03-03 | Ulvac Corp | Pressure controlling device for vacuum processing device |
| US4949670A (en) * | 1988-11-04 | 1990-08-21 | Tegal Corporation | Method and apparatus for low pressure plasma |
| US5415718A (en) * | 1990-09-21 | 1995-05-16 | Tadahiro Ohmi | Reactive ion etching device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| FI945112A0 (en) | Apparatus and method for endometrial ablation | |
| KR860009604A (en) | Plasma processing equipment | |
| JPS57138208A (en) | Power detecting circuit and gain control circuit using it | |
| JPS567432A (en) | Controlling method for low pressure of vacuum apparatus | |
| JPS57174467A (en) | Ion working device | |
| JPS567431A (en) | Method and apparatus for controlling low pressure of vacuum apparatus | |
| JPS60138291A (en) | Pressure control device of gas | |
| JPS5723226A (en) | Plasma etching device | |
| GB1517952A (en) | Glow-discharge electron-gun apparatus | |
| JPS6464217A (en) | Applicator for photo-resist | |
| JPS56167733A (en) | Treatment of inner surface of vinyl chloride type resin tubular body | |
| JPS5636046A (en) | Detecting device for relative humidity | |
| JPS5773205A (en) | High pressure control unit | |
| JPS56165327A (en) | Method and apparatus for monitoring plasma etching | |
| JPS5445849A (en) | Induction heater controller | |
| JPS5639127A (en) | Expansively forming method for ring shape material by liquid pressure | |
| JPS5732637A (en) | Dry etching apparatus | |
| JPS57153702A (en) | Nozzle for continuous vacuum drying apparatus | |
| JPS54124805A (en) | Sintering machine | |
| Hubert et al. | Method and Apparatus for Coating a Substrate | |
| JPS56130465A (en) | Film forming method | |
| JPS57101326A (en) | Electron beam device | |
| JPS5516471A (en) | Laser device | |
| JPS5534044A (en) | Radiofrequency thawing device | |
| JPS5759141A (en) | Method and apparatus for detecting concentration of gas |