JPS5685751A - Photomask - Google Patents

Photomask

Info

Publication number
JPS5685751A
JPS5685751A JP16251579A JP16251579A JPS5685751A JP S5685751 A JPS5685751 A JP S5685751A JP 16251579 A JP16251579 A JP 16251579A JP 16251579 A JP16251579 A JP 16251579A JP S5685751 A JPS5685751 A JP S5685751A
Authority
JP
Japan
Prior art keywords
layer
protrusion
visor
occurrence
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16251579A
Other languages
Japanese (ja)
Inventor
Shinya Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16251579A priority Critical patent/JPS5685751A/en
Publication of JPS5685751A publication Critical patent/JPS5685751A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To obtain a fine pattern by forming a Cr layer, a CrO layer and a Cr layer on a glass substrate in this order to prevent the formation of a visor-shaped protrusion in etching and the occurrence of indentation due to a fall of the protrusion. CONSTITUTION:Cr layer 2 is formed on glass substrate 1, CrO layer 3 on layer 2, and about 20-30Angstrom Cr layer 2' on layer 3 by vapor deposition or other method. On layer 2' a photoresist is formed, and after carrying out patternwise exposure and development, layers 2, 3, 2' are simultaneously etched with a mixed aqueous soln. of ceric ammonium nitrate and perchloric acid using the resulting resist as a mask. Layer 2' prevents layer 3 from protruding in the form of visor B owing to the etching speed difference between layers 2, 3, and the occurrence of indentation due to a partial fall of the protrusion is prevented. Thus, pattern A with high resolving power is obtd.
JP16251579A 1979-12-14 1979-12-14 Photomask Pending JPS5685751A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16251579A JPS5685751A (en) 1979-12-14 1979-12-14 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16251579A JPS5685751A (en) 1979-12-14 1979-12-14 Photomask

Publications (1)

Publication Number Publication Date
JPS5685751A true JPS5685751A (en) 1981-07-13

Family

ID=15756081

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16251579A Pending JPS5685751A (en) 1979-12-14 1979-12-14 Photomask

Country Status (1)

Country Link
JP (1) JPS5685751A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017161931A (en) * 2017-05-17 2017-09-14 Hoya株式会社 Mask blank, transfer mask manufacturing method, and semiconductor device manufacturing method
JP2018087998A (en) * 2014-03-30 2018-06-07 Hoya株式会社 Mask blank, transfer mask manufacturing method, and semiconductor device manufacturing method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5451831A (en) * 1977-09-30 1979-04-24 Konishiroku Photo Ind Co Ltd Photomask material

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5451831A (en) * 1977-09-30 1979-04-24 Konishiroku Photo Ind Co Ltd Photomask material

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018087998A (en) * 2014-03-30 2018-06-07 Hoya株式会社 Mask blank, transfer mask manufacturing method, and semiconductor device manufacturing method
JP2017161931A (en) * 2017-05-17 2017-09-14 Hoya株式会社 Mask blank, transfer mask manufacturing method, and semiconductor device manufacturing method

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