JPS5690565A - Schottky barrier diode - Google Patents
Schottky barrier diodeInfo
- Publication number
- JPS5690565A JPS5690565A JP16850779A JP16850779A JPS5690565A JP S5690565 A JPS5690565 A JP S5690565A JP 16850779 A JP16850779 A JP 16850779A JP 16850779 A JP16850779 A JP 16850779A JP S5690565 A JPS5690565 A JP S5690565A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- schottky barrier
- diode
- region
- ohmic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D8/00—Diodes
- H10D8/60—Schottky-barrier diodes
Landscapes
- Electrodes Of Semiconductors (AREA)
Abstract
PURPOSE:To obtain a diode functioning at high speed by a method wherein a P<+> layer is formed on a surface of a ringed I layer on an N layer, a common electrode is attached, the contacts of both the N layer and a Schottky barrier property and both the I layer and an ohmic property are made up, and an ohmic electrode is fitted on the back. CONSTITUTION:An I (intrinsic semiconductor) layer 45 is circularly formed on a main surface of an N<-> layer 42 on an N<+> type substrate 41, and a P<+> layer 46 is made up in the region. A metal layer 50 is attached in common on the surfaces of a region 47 surrounded by the I layer and the P<+> layer 46, and both the region 47 and a Schottky barrier contact 51, both the layer 46 and an ohmic contact 52 and both the substrate 41 and an ohmic contact 55 are built up. A layer 56 is an insulating layer. According to this constitution, a composite element in which a Schottky barrier diode and a PIN diode are connected in parallel in the same polarity is formed, a depletion layer finally expands to the whole region 47 and currents in the reverse direction do not flow when the electrode 50 is made negative and voltage is applied, and a diode is obtained which has characteristics more superior than a normal Schottky barrier diode.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP54168507A JPS5949713B2 (en) | 1979-12-25 | 1979-12-25 | shotgun barrier diode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP54168507A JPS5949713B2 (en) | 1979-12-25 | 1979-12-25 | shotgun barrier diode |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5690565A true JPS5690565A (en) | 1981-07-22 |
| JPS5949713B2 JPS5949713B2 (en) | 1984-12-04 |
Family
ID=15869331
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP54168507A Expired JPS5949713B2 (en) | 1979-12-25 | 1979-12-25 | shotgun barrier diode |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5949713B2 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4607270A (en) * | 1983-06-16 | 1986-08-19 | Kabushiki Kaisha Toshiba | Schottky barrier diode with guard ring |
| US5338966A (en) * | 1989-09-21 | 1994-08-16 | Toko Kabushiki Kaisha | Variable capacitance diode device |
| US7528459B2 (en) * | 2003-05-27 | 2009-05-05 | Nxp B.V. | Punch-through diode and method of processing the same |
| JP2009535853A (en) * | 2006-05-02 | 2009-10-01 | セミサウス ラボラトリーズ インコーポレイテッド | Semiconductor device with surge current protection and manufacturing method thereof |
| CN103178095A (en) * | 2011-12-26 | 2013-06-26 | 比亚迪股份有限公司 | High temperature schottky diode |
| WO2016071969A1 (en) * | 2014-11-05 | 2016-05-12 | 新電元工業株式会社 | Semiconductor device |
-
1979
- 1979-12-25 JP JP54168507A patent/JPS5949713B2/en not_active Expired
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4607270A (en) * | 1983-06-16 | 1986-08-19 | Kabushiki Kaisha Toshiba | Schottky barrier diode with guard ring |
| US5338966A (en) * | 1989-09-21 | 1994-08-16 | Toko Kabushiki Kaisha | Variable capacitance diode device |
| US7528459B2 (en) * | 2003-05-27 | 2009-05-05 | Nxp B.V. | Punch-through diode and method of processing the same |
| JP2009535853A (en) * | 2006-05-02 | 2009-10-01 | セミサウス ラボラトリーズ インコーポレイテッド | Semiconductor device with surge current protection and manufacturing method thereof |
| CN103178095A (en) * | 2011-12-26 | 2013-06-26 | 比亚迪股份有限公司 | High temperature schottky diode |
| WO2016071969A1 (en) * | 2014-11-05 | 2016-05-12 | 新電元工業株式会社 | Semiconductor device |
| US9947806B2 (en) | 2014-11-05 | 2018-04-17 | Shindengen Electric Manufacturing Co., Ltd. | Semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5949713B2 (en) | 1984-12-04 |
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