JPS5690802A - Photocurable composition - Google Patents
Photocurable compositionInfo
- Publication number
- JPS5690802A JPS5690802A JP16754379A JP16754379A JPS5690802A JP S5690802 A JPS5690802 A JP S5690802A JP 16754379 A JP16754379 A JP 16754379A JP 16754379 A JP16754379 A JP 16754379A JP S5690802 A JPS5690802 A JP S5690802A
- Authority
- JP
- Japan
- Prior art keywords
- meth
- groups
- epoxy resin
- acid
- acrylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Polymerisation Methods In General (AREA)
- Epoxy Resins (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
PURPOSE: Titled composition having good adhesion to substrates and being useful as a coating and a material for electrical parts, comprising, as a base polymer, a modified epoxy resin having functional groups to which are added a half ester compound of an aromatic polycarboxylic acid and an acid phosphate ester.
CONSTITUTION: A photocurable composition comprising, as a base polymer, a modified epoxy resin prepared by adding, to about 25W65% of the total epoxy groups of a bisphenol type liquid epoxy resin such as an epoxy group-containing liquid resin prepared from 2,2-bis(4'-hydroxyphenyl)propane and epichlorohydrin, a half ester compound from an aromatic polycarboxylic acid such as isophthalic acid and a hydroxyl group-containing (meth)acrylate such as 2-hydroxyethyl (meth) acrylate and adding, to at least 80% of the remaining epoxy groups, a (meth) acryloyl group-containing acid phosphate ester such as one represented by the formula, wherein R is H or CH3, A is a residue derived by removing OH groups usable in an ester linkage from a diol compound, X is 1W3 and n is 1W2.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16754379A JPS5690802A (en) | 1979-12-25 | 1979-12-25 | Photocurable composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16754379A JPS5690802A (en) | 1979-12-25 | 1979-12-25 | Photocurable composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5690802A true JPS5690802A (en) | 1981-07-23 |
| JPS6210522B2 JPS6210522B2 (en) | 1987-03-06 |
Family
ID=15851649
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16754379A Granted JPS5690802A (en) | 1979-12-25 | 1979-12-25 | Photocurable composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5690802A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62133425A (en) * | 1985-12-06 | 1987-06-16 | Sumitomo Bakelite Co Ltd | Composition of sealing material for liquid crystal cell |
-
1979
- 1979-12-25 JP JP16754379A patent/JPS5690802A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62133425A (en) * | 1985-12-06 | 1987-06-16 | Sumitomo Bakelite Co Ltd | Composition of sealing material for liquid crystal cell |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6210522B2 (en) | 1987-03-06 |
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