JPS57128924A - Mask positioning and equipment for the same - Google Patents

Mask positioning and equipment for the same

Info

Publication number
JPS57128924A
JPS57128924A JP56014302A JP1430281A JPS57128924A JP S57128924 A JPS57128924 A JP S57128924A JP 56014302 A JP56014302 A JP 56014302A JP 1430281 A JP1430281 A JP 1430281A JP S57128924 A JPS57128924 A JP S57128924A
Authority
JP
Japan
Prior art keywords
output
targets
recognition process
process circuit
pulse
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56014302A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0159732B2 (2
Inventor
Yoshihiko Kiyokuni
Masaki Tsukagoshi
Tetsuo Noguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56014302A priority Critical patent/JPS57128924A/ja
Publication of JPS57128924A publication Critical patent/JPS57128924A/ja
Publication of JPH0159732B2 publication Critical patent/JPH0159732B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP56014302A 1981-02-04 1981-02-04 Mask positioning and equipment for the same Granted JPS57128924A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56014302A JPS57128924A (en) 1981-02-04 1981-02-04 Mask positioning and equipment for the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56014302A JPS57128924A (en) 1981-02-04 1981-02-04 Mask positioning and equipment for the same

Publications (2)

Publication Number Publication Date
JPS57128924A true JPS57128924A (en) 1982-08-10
JPH0159732B2 JPH0159732B2 (2) 1989-12-19

Family

ID=11857296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56014302A Granted JPS57128924A (en) 1981-02-04 1981-02-04 Mask positioning and equipment for the same

Country Status (1)

Country Link
JP (1) JPS57128924A (2)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63197953A (ja) * 1987-02-10 1988-08-16 Orc Mfg Co Ltd マスクフイルムとワ−ク基板との自動位置決め方法
JP2006145030A (ja) * 2004-10-22 2006-06-08 Celaya Emparanza Y Galdos Internacional Sa 家庭で用いる加圧水蒸気発生装置用安全遮断機構

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63197953A (ja) * 1987-02-10 1988-08-16 Orc Mfg Co Ltd マスクフイルムとワ−ク基板との自動位置決め方法
JP2006145030A (ja) * 2004-10-22 2006-06-08 Celaya Emparanza Y Galdos Internacional Sa 家庭で用いる加圧水蒸気発生装置用安全遮断機構

Also Published As

Publication number Publication date
JPH0159732B2 (2) 1989-12-19

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