JPS5227367A - Photo resist processing apparatus - Google Patents

Photo resist processing apparatus

Info

Publication number
JPS5227367A
JPS5227367A JP50102971A JP10297175A JPS5227367A JP S5227367 A JPS5227367 A JP S5227367A JP 50102971 A JP50102971 A JP 50102971A JP 10297175 A JP10297175 A JP 10297175A JP S5227367 A JPS5227367 A JP S5227367A
Authority
JP
Japan
Prior art keywords
photo resist
resist processing
processing apparatus
processing
stabilized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50102971A
Other languages
Japanese (ja)
Inventor
Jun Suzuki
Hiroshi Maejima
Hiroto Nagatomo
Mutsuyo Kanetani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50102971A priority Critical patent/JPS5227367A/en
Publication of JPS5227367A publication Critical patent/JPS5227367A/en
Pending legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To obtain a photo resist processing equipment, through which stabilized and consistent processing can be ensured, continuous processing for different lots of various types is possible, and good yield is secured for photo resist processing.
COPYRIGHT: (C)1977,JPO&Japio
JP50102971A 1975-08-27 1975-08-27 Photo resist processing apparatus Pending JPS5227367A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50102971A JPS5227367A (en) 1975-08-27 1975-08-27 Photo resist processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50102971A JPS5227367A (en) 1975-08-27 1975-08-27 Photo resist processing apparatus

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP59092849A Division JPS605516A (en) 1984-05-11 1984-05-11 Device for processing semiconductor wafer

Publications (1)

Publication Number Publication Date
JPS5227367A true JPS5227367A (en) 1977-03-01

Family

ID=14341634

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50102971A Pending JPS5227367A (en) 1975-08-27 1975-08-27 Photo resist processing apparatus

Country Status (1)

Country Link
JP (1) JPS5227367A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5473475A (en) * 1977-11-24 1979-06-12 Hitachi Ltd Device for washing and drying
JPS5480081A (en) * 1977-12-09 1979-06-26 Ulvac Corp Process plate vacuum device
JPS57118639A (en) * 1981-01-16 1982-07-23 Toshiba Corp Process control of semiconductor photo-etching
JPS58199349A (en) * 1982-05-17 1983-11-19 Toshiba Corp In-line device of photoetching
JPS59159943U (en) * 1983-04-13 1984-10-26 富士通株式会社 semiconductor processing equipment
JPH0255360A (en) * 1988-08-22 1990-02-23 Tokyo Electron Ltd Regist processor
JPH08227928A (en) * 1988-02-12 1996-09-03 Tokyo Electron Ltd Resist processing apparatus and resist processing method
JPH08227929A (en) * 1988-02-12 1996-09-03 Tokyo Electron Ltd Processing equipment

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5473475A (en) * 1977-11-24 1979-06-12 Hitachi Ltd Device for washing and drying
JPS5480081A (en) * 1977-12-09 1979-06-26 Ulvac Corp Process plate vacuum device
JPS57118639A (en) * 1981-01-16 1982-07-23 Toshiba Corp Process control of semiconductor photo-etching
JPS58199349A (en) * 1982-05-17 1983-11-19 Toshiba Corp In-line device of photoetching
JPS59159943U (en) * 1983-04-13 1984-10-26 富士通株式会社 semiconductor processing equipment
JPH08227928A (en) * 1988-02-12 1996-09-03 Tokyo Electron Ltd Resist processing apparatus and resist processing method
JPH08227929A (en) * 1988-02-12 1996-09-03 Tokyo Electron Ltd Processing equipment
JPH0255360A (en) * 1988-08-22 1990-02-23 Tokyo Electron Ltd Regist processor

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