JPS57182741A - Photomask blank plate - Google Patents

Photomask blank plate

Info

Publication number: JPS57182741A
Authority: JP; Japan
Prior art keywords: layer; material selected; conductive; blank plate; static electricity
Prior art date: 1981-05-07
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP6869481A

Other languages

English (en)

Japanese (ja)

Other versions

JPS6322301B2 (fr

Inventor

Chihiro Tabuchi

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Dai Nippon Printing Co Ltd

Original Assignee

Dai Nippon Printing Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1981-05-07

Filing date

1981-05-07

Publication date

1982-11-10

1981-05-07 Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd

1981-05-07 Priority to JP6869481A priority Critical patent/JPS57182741A/ja

1981-09-28 Priority to EP81107702A priority patent/EP0049799B1/fr

1981-09-28 Priority to DE8181107702T priority patent/DE3173769D1/de

1981-11-04 Priority to US06/318,201 priority patent/US4440841A/en

1982-11-10 Publication of JPS57182741A publication Critical patent/JPS57182741A/ja

1988-05-11 Publication of JPS6322301B2 publication Critical patent/JPS6322301B2/ja

Status Granted legal-status Critical Current

Links

239000010410 layer Substances 0.000 abstract 3
239000000463 material Substances 0.000 abstract 3
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 2
230000007547 defect Effects 0.000 abstract 2
QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 abstract 2
230000005611 electricity Effects 0.000 abstract 2
239000010408 film Substances 0.000 abstract 2
230000003068 static effect Effects 0.000 abstract 2
229910052715 tantalum Inorganic materials 0.000 abstract 2
239000010409 thin film Substances 0.000 abstract 2
XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 abstract 2
229910004481 Ta2O3 Inorganic materials 0.000 abstract 1
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 abstract 1
CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 abstract 1
229910000422 cerium(IV) oxide Inorganic materials 0.000 abstract 1
229910052804 chromium Inorganic materials 0.000 abstract 1
229910052681 coesite Inorganic materials 0.000 abstract 1
229910052593 corundum Inorganic materials 0.000 abstract 1
229910052906 cristobalite Inorganic materials 0.000 abstract 1
229910052737 gold Inorganic materials 0.000 abstract 1
PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 abstract 1
JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 abstract 1
CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 abstract 1
229910052750 molybdenum Inorganic materials 0.000 abstract 1
229910052758 niobium Inorganic materials 0.000 abstract 1
230000001681 protective effect Effects 0.000 abstract 1
239000011241 protective layer Substances 0.000 abstract 1
229910052710 silicon Inorganic materials 0.000 abstract 1
239000000377 silicon dioxide Substances 0.000 abstract 1
235000012239 silicon dioxide Nutrition 0.000 abstract 1
229910052682 stishovite Inorganic materials 0.000 abstract 1
239000000126 substance Substances 0.000 abstract 1
239000000758 substrate Substances 0.000 abstract 1
229910052719 titanium Inorganic materials 0.000 abstract 1
229910052905 tridymite Inorganic materials 0.000 abstract 1
229910052721 tungsten Inorganic materials 0.000 abstract 1
229910052720 vanadium Inorganic materials 0.000 abstract 1
229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
229910052726 zirconium Inorganic materials 0.000 abstract 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/40—Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Preparing Plates And Mask In Photomechanical Process (AREA)

JP6869481A 1980-10-09 1981-05-07 Photomask blank plate Granted JPS57182741A (en)

Priority Applications (4)

Application Number	Priority Date	Filing Date	Title
JP6869481A JPS57182741A (en)	1981-05-07	1981-05-07	Photomask blank plate
EP81107702A EP0049799B1 (fr)	1980-10-09	1981-09-28	Photoréserve vierge et photomasque
DE8181107702T DE3173769D1 (en)	1980-10-09	1981-09-28	Photomask blank and photomask
US06/318,201 US4440841A (en)	1981-02-28	1981-11-04	Photomask and photomask blank

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP6869481A JPS57182741A (en)	1981-05-07	1981-05-07	Photomask blank plate

Publications (2)

Publication Number	Publication Date
JPS57182741A true JPS57182741A (en)	1982-11-10
JPS6322301B2 JPS6322301B2 (fr)	1988-05-11

Family

ID=13381119

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP6869481A Granted JPS57182741A (en)	1980-10-09	1981-05-07	Photomask blank plate

Country Status (1)

Country	Link
JP (1)	JPS57182741A (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS60123843A (ja) *	1983-12-09	1985-07-02	Hoya Corp	フォトマスクブランクとフォトマスク
JP2014081449A (ja) *	2012-10-15	2014-05-08	Clean Surface Gijutsu:Kk	マスクブランクス及びフォトマスク

Citations (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS4953039A (fr) *	1972-06-20	1974-05-23
JPS5352073A (en) *	1976-10-22	1978-05-12	Hoya Denshi Kk	Photomask for ic
JPS5444479A (en) *	1977-09-12	1979-04-07	Ibm	Sealed cooler
JPS5451831A (en) *	1977-09-30	1979-04-24	Konishiroku Photo Ind Co Ltd	Photomask material
JPS55147628A (en) *	1979-05-07	1980-11-17	Chiyou Lsi Gijutsu Kenkyu Kumiai	Mask base material
JPS55161240A (en) *	1979-06-04	1980-12-15	Dainippon Printing Co Ltd	Photomask
JPS5619054A (en) *	1979-07-25	1981-02-23	Mitsubishi Electric Corp	Metal photomask
JPS57144550A (en) *	1981-02-28	1982-09-07	Dainippon Printing Co Ltd	Blank plate for photomask

1981
- 1981-05-07 JP JP6869481A patent/JPS57182741A/ja active Granted

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS4953039A (fr) *	1972-06-20	1974-05-23
JPS5352073A (en) *	1976-10-22	1978-05-12	Hoya Denshi Kk	Photomask for ic
JPS5444479A (en) *	1977-09-12	1979-04-07	Ibm	Sealed cooler
JPS5451831A (en) *	1977-09-30	1979-04-24	Konishiroku Photo Ind Co Ltd	Photomask material
JPS55147628A (en) *	1979-05-07	1980-11-17	Chiyou Lsi Gijutsu Kenkyu Kumiai	Mask base material
JPS55161240A (en) *	1979-06-04	1980-12-15	Dainippon Printing Co Ltd	Photomask
JPS5619054A (en) *	1979-07-25	1981-02-23	Mitsubishi Electric Corp	Metal photomask
JPS57144550A (en) *	1981-02-28	1982-09-07	Dainippon Printing Co Ltd	Blank plate for photomask

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS60123843A (ja) *	1983-12-09	1985-07-02	Hoya Corp	フォトマスクブランクとフォトマスク
JP2014081449A (ja) *	2012-10-15	2014-05-08	Clean Surface Gijutsu:Kk	マスクブランクス及びフォトマスク
US9280045B2 (en)	2012-10-15	2016-03-08	Clean Surface Technology Co.	Mask blank and photomask

Also Published As

Publication number	Publication date
JPS6322301B2 (fr)	1988-05-11

Publication	Publication Date	Title
SE7713878L (sv)	1978-06-09	Glaskomposition
TW337515B (en)	1998-08-01	Coated abstrate and process for its formation
YU47569B (sh)	1995-10-03	Sastav obojenog stakla i proizvod izradjen od njega
ES2139188T3 (es)	2000-02-01	Lentes de cristal transparentes de tono fijo.
JPS5764739A (en)	1982-04-20	Photomask substrate and photomask
JPS5451831A (en)	1979-04-24	Photomask material
JPS643036A (en)	1989-01-06	Low-reflection coated article
JPS57182740A (en)	1982-11-10	Photomask
SE334424B (fr)	1971-04-26
JPS57167025A (en)	1982-10-14	Photo mask
JPS55161240A (en)	1980-12-15	Photomask
JPS57129839A (en)	1982-08-12	Cover glass for watch
JPS57144549A (en)	1982-09-07	Photomask
JPS57144550A (en)	1982-09-07	Blank plate for photomask
GB1452116A (en)	1976-10-13	Method of depositing a pattern of metal areas
FR2414027A1 (fr)	1979-08-03	Verres usinables
JPS5654252A (en)	1981-05-14	Alumino silicate glass
JPS6414094A (en)	1989-01-18	Secrecy holding sheet
GB889107A (en)	1962-02-07	Improvements in or relating to contact screens for use in graphic reproduction
JPS57147634A (en)	1982-09-11	Photomask blank
JPS57129838A (en)	1982-08-12	Cover glass for watch
JPS6428248A (en)	1989-01-30	Composite magnetic head
JPS544077A (en)	1979-01-12	Photo mask for far ultraviolet ray exposure
JPS56116034A (en)	1981-09-11	Photomask
JPS5696071A (en)	1981-08-03	Display plate for watch