JPS5723060A - Zinc oxide target for high frequency sputtering - Google Patents

Zinc oxide target for high frequency sputtering

Info

Publication number
JPS5723060A
JPS5723060A JP9838380A JP9838380A JPS5723060A JP S5723060 A JPS5723060 A JP S5723060A JP 9838380 A JP9838380 A JP 9838380A JP 9838380 A JP9838380 A JP 9838380A JP S5723060 A JPS5723060 A JP S5723060A
Authority
JP
Japan
Prior art keywords
target
zinc oxide
lid
cylindrical
connecting joint
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9838380A
Other languages
English (en)
Inventor
Shinji Shimazaki
Takayuki Kuroda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP9838380A priority Critical patent/JPS5723060A/ja
Publication of JPS5723060A publication Critical patent/JPS5723060A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP9838380A 1980-07-17 1980-07-17 Zinc oxide target for high frequency sputtering Pending JPS5723060A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9838380A JPS5723060A (en) 1980-07-17 1980-07-17 Zinc oxide target for high frequency sputtering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9838380A JPS5723060A (en) 1980-07-17 1980-07-17 Zinc oxide target for high frequency sputtering

Publications (1)

Publication Number Publication Date
JPS5723060A true JPS5723060A (en) 1982-02-06

Family

ID=14218339

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9838380A Pending JPS5723060A (en) 1980-07-17 1980-07-17 Zinc oxide target for high frequency sputtering

Country Status (1)

Country Link
JP (1) JPS5723060A (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60126619U (ja) * 1984-02-06 1985-08-26 株式会社ノダ 建築用床板
JPS61102737U (ja) * 1984-12-13 1986-06-30
JPH0558744U (ja) * 1992-01-22 1993-08-03 株式会社▲桟▼製材所 フローリング材
JP2012046807A (ja) * 2010-08-30 2012-03-08 Solar Applied Materials Technology Corp 中空ターゲット組立体
CN107523794A (zh) * 2017-09-07 2017-12-29 于盟盟 一种用于溅射透明导电薄膜的靶材

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60126619U (ja) * 1984-02-06 1985-08-26 株式会社ノダ 建築用床板
JPS61102737U (ja) * 1984-12-13 1986-06-30
JPH0558744U (ja) * 1992-01-22 1993-08-03 株式会社▲桟▼製材所 フローリング材
JP2012046807A (ja) * 2010-08-30 2012-03-08 Solar Applied Materials Technology Corp 中空ターゲット組立体
CN107523794A (zh) * 2017-09-07 2017-12-29 于盟盟 一种用于溅射透明导电薄膜的靶材

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