JPS5723255B2 - - Google Patents
Info
- Publication number
- JPS5723255B2 JPS5723255B2 JP9615079A JP9615079A JPS5723255B2 JP S5723255 B2 JPS5723255 B2 JP S5723255B2 JP 9615079 A JP9615079 A JP 9615079A JP 9615079 A JP9615079 A JP 9615079A JP S5723255 B2 JPS5723255 B2 JP S5723255B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/705—Compositions containing chalcogenides, metals or alloys thereof, as photosensitive substances, e.g. photodope systems
Landscapes
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9615079A JPS5546753A (en) | 1979-07-30 | 1979-07-30 | Pattern formation method using photosensitive chalcogenide layer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9615079A JPS5546753A (en) | 1979-07-30 | 1979-07-30 | Pattern formation method using photosensitive chalcogenide layer |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP51066879A Division JPS5934295B2 (ja) | 1976-06-08 | 1976-06-08 | 感光性カルコゲナイド層を有するパタ−ン形成用感光性材及びその製法及び感光性カルコゲナイド層を使用したパタ−ン形成用光学マスク及びパタ−ン形成法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5546753A JPS5546753A (en) | 1980-04-02 |
| JPS5723255B2 true JPS5723255B2 (cs) | 1982-05-18 |
Family
ID=14157341
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9615079A Granted JPS5546753A (en) | 1979-07-30 | 1979-07-30 | Pattern formation method using photosensitive chalcogenide layer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5546753A (cs) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2810561B2 (ja) * | 1991-05-28 | 1998-10-15 | カヤバ工業株式会社 | 動揺機構 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5435086B2 (cs) * | 1972-05-23 | 1979-10-31 |
-
1979
- 1979-07-30 JP JP9615079A patent/JPS5546753A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5546753A (en) | 1980-04-02 |