JPS5734362A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5734362A JPS5734362A JP11001880A JP11001880A JPS5734362A JP S5734362 A JPS5734362 A JP S5734362A JP 11001880 A JP11001880 A JP 11001880A JP 11001880 A JP11001880 A JP 11001880A JP S5734362 A JPS5734362 A JP S5734362A
- Authority
- JP
- Japan
- Prior art keywords
- region
- regions
- collector
- whereon
- withstand voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
Landscapes
- Bipolar Transistors (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE:To obtain a power transistor with a built-in protective diode by a method wherein a region having high impurity density is provided within the area, whereon a depletion layer will be formed, on the obverse side of the collector region of a junction transistor. CONSTITUTION:The protective diode is consisted of the N<+> region 5 to be provided within the collector region 2 and a base region 3 and a device 8 is formed in one body. The region 5 is formed within the area whereon the collector depletion layer will be formed and the density ratio between the regions 5 and 2 is established in proportion to the distance between the regions 3 and 5 in such manner that the withstand voltage between the regions 3 and 5 will be made smaller than that of the regions 3 and 2. However, this distance should be within the scope with which the reverse withstand voltage between the collector and emitter will not be reduced. Through these procedures, a miniaturized and highly integrated device can be manufactured at a low cost and the reliability of which can also be increased.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11001880A JPS5734362A (en) | 1980-08-11 | 1980-08-11 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11001880A JPS5734362A (en) | 1980-08-11 | 1980-08-11 | Semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5734362A true JPS5734362A (en) | 1982-02-24 |
Family
ID=14525031
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11001880A Pending JPS5734362A (en) | 1980-08-11 | 1980-08-11 | Semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5734362A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60226176A (en) * | 1984-04-25 | 1985-11-11 | Matsushita Electronics Corp | Semiconductor device |
-
1980
- 1980-08-11 JP JP11001880A patent/JPS5734362A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60226176A (en) * | 1984-04-25 | 1985-11-11 | Matsushita Electronics Corp | Semiconductor device |
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