JPS574151A - Mos integrated circuit device - Google Patents
Mos integrated circuit deviceInfo
- Publication number
- JPS574151A JPS574151A JP7773680A JP7773680A JPS574151A JP S574151 A JPS574151 A JP S574151A JP 7773680 A JP7773680 A JP 7773680A JP 7773680 A JP7773680 A JP 7773680A JP S574151 A JPS574151 A JP S574151A
- Authority
- JP
- Japan
- Prior art keywords
- voltage
- junction
- area
- yield
- mosfet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE:To provide a positive prevention of damage of insulation in all gate oxidation films by a method wherein a yield junction voltage generated among a power supply, a drain electric pole and a substrate plate is set lower than an insulating breaking voltage in the gate oxidation film. CONSTITUTION:Withstand voltage in the parasitic diode caused by p<+>n junction between a source electrode 22 or a drain electrode 23 in all MOSFET 24a, 24b connected to the power supply terminal 12 and the output terminal and Si base plate 28 of different polarity, and n<+>p junction with p area 29 is set lower than the insulative breakdown voltage. A concentration degree of impurities Nt at a high specific resistance producing yield voltage at the junction is derived separately and a concentration degree of impurities at the area of different polarity other than channel parts 26a, 26b adjacent to the electrodes 22, 23 is set as a value of Nt. As a result, a protective diode having p<+>n or n<+>p junction formed between the electric poles 23, 22 and the substrate plate 28 as well as the area 29 is operated as a constant voltage element, thus only the yield voltage of these junctions may be applied to the gate Si oxidation film of MOSFET 24a, and 24b.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7773680A JPS574151A (en) | 1980-06-11 | 1980-06-11 | Mos integrated circuit device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7773680A JPS574151A (en) | 1980-06-11 | 1980-06-11 | Mos integrated circuit device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS574151A true JPS574151A (en) | 1982-01-09 |
| JPS6360547B2 JPS6360547B2 (en) | 1988-11-24 |
Family
ID=13642186
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7773680A Granted JPS574151A (en) | 1980-06-11 | 1980-06-11 | Mos integrated circuit device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS574151A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58159363A (en) * | 1982-03-17 | 1983-09-21 | Nec Corp | Input/output protecting device for semiconductor integrated circuit |
| JPS5969957A (en) * | 1982-10-15 | 1984-04-20 | Nec Corp | Protective device for output |
| JPS59191371A (en) * | 1983-04-14 | 1984-10-30 | Nec Corp | Complementary type metal oxide semiconductor field-effect device |
| JPS6010767A (en) * | 1983-06-30 | 1985-01-19 | Fujitsu Ltd | Semiconductor device |
| JPH02369A (en) * | 1987-11-24 | 1990-01-05 | Nec Corp | Semiconductor device |
| JP2009099679A (en) * | 2007-10-15 | 2009-05-07 | Mitsumi Electric Co Ltd | MOS transistor and semiconductor integrated circuit device using the same |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55132065A (en) * | 1979-04-02 | 1980-10-14 | Sharp Corp | Cmos circuit |
-
1980
- 1980-06-11 JP JP7773680A patent/JPS574151A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55132065A (en) * | 1979-04-02 | 1980-10-14 | Sharp Corp | Cmos circuit |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58159363A (en) * | 1982-03-17 | 1983-09-21 | Nec Corp | Input/output protecting device for semiconductor integrated circuit |
| JPS5969957A (en) * | 1982-10-15 | 1984-04-20 | Nec Corp | Protective device for output |
| JPS59191371A (en) * | 1983-04-14 | 1984-10-30 | Nec Corp | Complementary type metal oxide semiconductor field-effect device |
| JPS6010767A (en) * | 1983-06-30 | 1985-01-19 | Fujitsu Ltd | Semiconductor device |
| JPH02369A (en) * | 1987-11-24 | 1990-01-05 | Nec Corp | Semiconductor device |
| JP2009099679A (en) * | 2007-10-15 | 2009-05-07 | Mitsumi Electric Co Ltd | MOS transistor and semiconductor integrated circuit device using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6360547B2 (en) | 1988-11-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0335750A3 (en) | Vertical power mosfet having high withstand voltage and high switching speed | |
| JPS56169369A (en) | High withstand voltage mos field effect semiconductor device | |
| JPS5493981A (en) | Semiconductor device | |
| JPS574151A (en) | Mos integrated circuit device | |
| JPS6442177A (en) | Insulated gate transistor | |
| JPH0645530A (en) | Bidirectional-continuity insulated-gate field-effect transistor | |
| EP0161446A3 (en) | Semiconductor integrated circuit comprising a protective transistor and a mos transistor with an ldd structure | |
| JPS5745975A (en) | Input protecting device for semiconductor device | |
| US4688071A (en) | Circuit arrangement comprising a phototransistor | |
| JPS56133871A (en) | Mos field effect semiconductor device with high breakdown voltage | |
| JPS56133870A (en) | Mos field effect semiconductor device with high breakdown voltage | |
| JPS6442863A (en) | High-withstand voltage mos semiconductor device | |
| JPH03203263A (en) | Constant-voltage device | |
| JPS5667962A (en) | Gate protection circuit of mos field effect transistor | |
| JPS6414960A (en) | Semiconductor element | |
| JPS6461059A (en) | Semiconductor device | |
| JPS5685851A (en) | Complementary mos type semiconductor device | |
| JPS57176781A (en) | Superconductive device | |
| JPS5491067A (en) | Input protective circuit | |
| JPS56137673A (en) | Field-effect semiconductor device having open drain output | |
| JPS54140880A (en) | Semiconductor device | |
| SU1319001A1 (en) | Two-pole current stabilizer | |
| JPS5524433A (en) | Composite type semiconductor device | |
| JPS54146975A (en) | Protection circuit of semiconductor device | |
| JPS56165356A (en) | Mos semiconductor device |