JPS5743471A - Semiconductor memory cell - Google Patents
Semiconductor memory cellInfo
- Publication number
- JPS5743471A JPS5743471A JP55119345A JP11934580A JPS5743471A JP S5743471 A JPS5743471 A JP S5743471A JP 55119345 A JP55119345 A JP 55119345A JP 11934580 A JP11934580 A JP 11934580A JP S5743471 A JPS5743471 A JP S5743471A
- Authority
- JP
- Japan
- Prior art keywords
- gate
- electrode
- acutely
- erasing
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/68—Floating-gate IGFETs
- H10D30/681—Floating-gate IGFETs having only two programming levels
- H10D30/683—Floating-gate IGFETs having only two programming levels programmed by tunnelling of carriers, e.g. Fowler-Nordheim tunnelling
Landscapes
- Non-Volatile Memory (AREA)
Abstract
PURPOSE:To enable the selective erasure of unnecessary information by acutely foming the end of a floating gate and forming an erasing electrode via an insulating film at the end of the gate. CONSTITUTION:P type source and drain regions 2, 3 are formed on the surface of an N type silicon substrate 1, gate insulating films 5, 5' are formed, and floating gates 4 are buried in the insulating films. The end 13 of the gate 4 is formed acutely, and an erasing electrode 12 is arranged via the film 5 on the acute part. When a voltage is applied to the electrode 12, an electric field is concentrated, since the end 13 of the gate 4 is formed acutely, to this part to become a strong electric field, thereby occurring readily a tunnel effect and causing the charge to pass through the film 5'. Accordingly, when the source and drain electrodes 6, 7 are grounded and the electrode 12 is applied with the prescribed positive voltage, the electron collected to the gate 4 are flowed out to the electrode 12 by the tunnel effect, thereby erasing the stored infomation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55119345A JPS5743471A (en) | 1980-08-29 | 1980-08-29 | Semiconductor memory cell |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55119345A JPS5743471A (en) | 1980-08-29 | 1980-08-29 | Semiconductor memory cell |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5743471A true JPS5743471A (en) | 1982-03-11 |
Family
ID=14759180
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55119345A Pending JPS5743471A (en) | 1980-08-29 | 1980-08-29 | Semiconductor memory cell |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5743471A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59120692U (en) * | 1983-02-01 | 1984-08-14 | 株式会社シマノ | Guide for bicycle gear shift operation cable |
-
1980
- 1980-08-29 JP JP55119345A patent/JPS5743471A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59120692U (en) * | 1983-02-01 | 1984-08-14 | 株式会社シマノ | Guide for bicycle gear shift operation cable |
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