JPS5749286A - Laser device - Google Patents

Laser device

Info

Publication number
JPS5749286A
JPS5749286A JP12452380A JP12452380A JPS5749286A JP S5749286 A JPS5749286 A JP S5749286A JP 12452380 A JP12452380 A JP 12452380A JP 12452380 A JP12452380 A JP 12452380A JP S5749286 A JPS5749286 A JP S5749286A
Authority
JP
Japan
Prior art keywords
laser
produce
film
250mum
consequence
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12452380A
Other languages
Japanese (ja)
Inventor
Hiroyuki Kasano
Shinkichi Tanimizu
Toshikatsu Machika
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12452380A priority Critical patent/JPS5749286A/en
Publication of JPS5749286A publication Critical patent/JPS5749286A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/32Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/327Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIBVI compounds, e.g. ZnCdSe-laser
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/32Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To produce a laser beam by an apparatus having, as an illumination core of a suitable concentration, a pair of electrode plates formed on two parallel surfaces of an active layer uniformly containing a rare earth element or a transition metal and by using an electroluminescense (EL). CONSTITUTION:An EL laser element is mounted on a copper heat sink 1. The element is formed by preparing a Zn single crystal plate 2 doped with Zn and Al and having a thickness of 250mum and a resistance of 20OMEGAcm, successively forming by spattering a ZnS single crystal film 3 of 500mum thick and containing 1% of Tb and having excessive Zn and a conductive mesa film 5 of In2O3 of 300nm thick, scribing pellets, attaching lead wires 7 and coating the thus formed structure with an Al2O3 film 6. The resonator has a width W of about 250mum and a length L of about 400mum. A D.C. variable power supply 8 is connected between the lead 7 and another read 71 to apply a bias. As the bias voltage is increased, the upper surface of the element starts to produce green light and a laser oscillation takes place as a threshold value is exceeded. The EL laser makes use of a collision excitation of local light emitting core caused by thermal electrons and, hence, suffers only a small influence of grid defect. In consequence, the oscillation can be carried out sufficiently even if there is a slight crystalline defect. In consequence, it is possible to mass produce the laser device at a reduced cost.
JP12452380A 1980-09-10 1980-09-10 Laser device Pending JPS5749286A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12452380A JPS5749286A (en) 1980-09-10 1980-09-10 Laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12452380A JPS5749286A (en) 1980-09-10 1980-09-10 Laser device

Publications (1)

Publication Number Publication Date
JPS5749286A true JPS5749286A (en) 1982-03-23

Family

ID=14887586

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12452380A Pending JPS5749286A (en) 1980-09-10 1980-09-10 Laser device

Country Status (1)

Country Link
JP (1) JPS5749286A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6390878A (en) * 1986-10-03 1988-04-21 Komatsu Ltd Laser device
JPS647686A (en) * 1987-06-30 1989-01-11 Komatsu Mfg Co Ltd Manufacture of solid-state laser and its manufacture
JPS647685A (en) * 1987-06-30 1989-01-11 Komatsu Mfg Co Ltd Manufacture of solid-state laser and its manufacture
JPH03134992A (en) * 1989-09-29 1991-06-07 Yu Holding Bvi Inc Electroluminescence device
JP2009530816A (en) * 2006-03-13 2009-08-27 ザ ユーエイビー リサーチ ファンデーション Electrically pumped (pumped) widely tunable mid-infrared laser based on quantum confined transition metal doped semiconductor

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6390878A (en) * 1986-10-03 1988-04-21 Komatsu Ltd Laser device
JPS647686A (en) * 1987-06-30 1989-01-11 Komatsu Mfg Co Ltd Manufacture of solid-state laser and its manufacture
JPS647685A (en) * 1987-06-30 1989-01-11 Komatsu Mfg Co Ltd Manufacture of solid-state laser and its manufacture
JPH03134992A (en) * 1989-09-29 1991-06-07 Yu Holding Bvi Inc Electroluminescence device
JP2009530816A (en) * 2006-03-13 2009-08-27 ザ ユーエイビー リサーチ ファンデーション Electrically pumped (pumped) widely tunable mid-infrared laser based on quantum confined transition metal doped semiconductor
JP2014131067A (en) * 2006-03-13 2014-07-10 Uab Research Foundation Electrically pumped(excited) widely adjustable mid-infrared laser based on quantum confined transition metal doped semiconductor

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