JPS5751290A - Electrolytic treatment of beltlike metallic plate - Google Patents

Electrolytic treatment of beltlike metallic plate

Info

Publication number
JPS5751290A
JPS5751290A JP12545980A JP12545980A JPS5751290A JP S5751290 A JPS5751290 A JP S5751290A JP 12545980 A JP12545980 A JP 12545980A JP 12545980 A JP12545980 A JP 12545980A JP S5751290 A JPS5751290 A JP S5751290A
Authority
JP
Japan
Prior art keywords
plate
point
axis
magnetic field
currents
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12545980A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6125800B2 (fr
Inventor
Hiroshi Shirai
Tsutomu Kakei
Teruo Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP12545980A priority Critical patent/JPS5751290A/ja
Publication of JPS5751290A publication Critical patent/JPS5751290A/ja
Publication of JPS6125800B2 publication Critical patent/JPS6125800B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrochemical Coating By Surface Reaction (AREA)
  • Electroplating Methods And Accessories (AREA)
JP12545980A 1980-09-10 1980-09-10 Electrolytic treatment of beltlike metallic plate Granted JPS5751290A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12545980A JPS5751290A (en) 1980-09-10 1980-09-10 Electrolytic treatment of beltlike metallic plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12545980A JPS5751290A (en) 1980-09-10 1980-09-10 Electrolytic treatment of beltlike metallic plate

Publications (2)

Publication Number Publication Date
JPS5751290A true JPS5751290A (en) 1982-03-26
JPS6125800B2 JPS6125800B2 (fr) 1986-06-17

Family

ID=14910614

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12545980A Granted JPS5751290A (en) 1980-09-10 1980-09-10 Electrolytic treatment of beltlike metallic plate

Country Status (1)

Country Link
JP (1) JPS5751290A (fr)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1625944A1 (fr) 2004-08-13 2006-02-15 Fuji Photo Film Co., Ltd. Procédé pour la production d'un support pour plaque lithographique
EP1712368A1 (fr) 2005-04-13 2006-10-18 Fuji Photo Film Co., Ltd. Procédé de fabrication d'un substrat pour plaque lithographique
EP2100677A1 (fr) 2008-03-06 2009-09-16 Fujifilm Corporation Procédé de fabrication d'une plaque en alliage d'aluminium pour une plaque d'impression lithographique, plaque en alliage d'aluminium pour plaque d'impression lithographique obtenue selon ce procédé et support de plaque d'impression lithographique
WO2010150810A1 (fr) 2009-06-26 2010-12-29 富士フイルム株式会社 Substrat réfléchissant la lumière et son procédé de fabrication
WO2011037005A1 (fr) 2009-09-24 2011-03-31 富士フイルム株式会社 Plaque originale d'impression lithographique
WO2011078010A1 (fr) 2009-12-25 2011-06-30 富士フイルム株式会社 Substrat isolé, procédé de production d'un substrat isolé, procédé de formation d'une ligne de câblage, substrat de câblage et élément électroluminescent
EP2384100A2 (fr) 2010-04-28 2011-11-02 Fujifilm Corporation Substrat à réflexion lumineuse isolée
EP2420869A2 (fr) 2010-08-16 2012-02-22 Fujifilm Corporation Plaque de réflexion à radiation pour DEL
WO2013005717A1 (fr) 2011-07-04 2013-01-10 富士フイルム株式会社 Substrat réfléchissant d'isolation, et procédé de fabrication de celui-ci
CN102912399A (zh) * 2012-11-13 2013-02-06 四川石棉华瑞电子有限公司 一种化成生产线用阴极极板结构
EP2586621A1 (fr) 2011-10-28 2013-05-01 Fujifilm Corporation Procédé et appareil de fabrication d'un support de plaque d'impression planographique

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62162980U (fr) * 1986-04-04 1987-10-16
JPH01149975U (fr) * 1988-04-06 1989-10-17

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1625944A1 (fr) 2004-08-13 2006-02-15 Fuji Photo Film Co., Ltd. Procédé pour la production d'un support pour plaque lithographique
EP1712368A1 (fr) 2005-04-13 2006-10-18 Fuji Photo Film Co., Ltd. Procédé de fabrication d'un substrat pour plaque lithographique
EP2100677A1 (fr) 2008-03-06 2009-09-16 Fujifilm Corporation Procédé de fabrication d'une plaque en alliage d'aluminium pour une plaque d'impression lithographique, plaque en alliage d'aluminium pour plaque d'impression lithographique obtenue selon ce procédé et support de plaque d'impression lithographique
WO2010150810A1 (fr) 2009-06-26 2010-12-29 富士フイルム株式会社 Substrat réfléchissant la lumière et son procédé de fabrication
WO2011037005A1 (fr) 2009-09-24 2011-03-31 富士フイルム株式会社 Plaque originale d'impression lithographique
WO2011078010A1 (fr) 2009-12-25 2011-06-30 富士フイルム株式会社 Substrat isolé, procédé de production d'un substrat isolé, procédé de formation d'une ligne de câblage, substrat de câblage et élément électroluminescent
EP2384100A2 (fr) 2010-04-28 2011-11-02 Fujifilm Corporation Substrat à réflexion lumineuse isolée
EP2420869A2 (fr) 2010-08-16 2012-02-22 Fujifilm Corporation Plaque de réflexion à radiation pour DEL
WO2013005717A1 (fr) 2011-07-04 2013-01-10 富士フイルム株式会社 Substrat réfléchissant d'isolation, et procédé de fabrication de celui-ci
EP2586621A1 (fr) 2011-10-28 2013-05-01 Fujifilm Corporation Procédé et appareil de fabrication d'un support de plaque d'impression planographique
CN102912399A (zh) * 2012-11-13 2013-02-06 四川石棉华瑞电子有限公司 一种化成生产线用阴极极板结构
CN102912399B (zh) * 2012-11-13 2016-03-23 四川石棉华瑞电子有限公司 一种化成生产线用阴极极板结构

Also Published As

Publication number Publication date
JPS6125800B2 (fr) 1986-06-17

Similar Documents

Publication Publication Date Title
JPS5751290A (en) Electrolytic treatment of beltlike metallic plate
ATE252730T1 (de) Zelle für elektrochemilumineszenz mit potentialfreien reaktionselektroden
GB8502078D0 (en) Control of scale formation
MY119378A (en) A copper foil for a printed circuit board, a process and an apparatus for producing the same
ES8404422A1 (es) Procedimiento y dispositivo para el tratamiento y refinado de aleaciones metalicas liquidas, mediante arco voltaico de corriente continua.
JPS5794586A (en) Method for stopping conduction of electricity of electrolytic cell
JPS56139697A (en) Treatment apparatus used exclusively for one side of continuous coil alumite
JPS57200550A (en) Plating method
JPS55152200A (en) Electroplating
JPS5757896A (en) Electrolyzing device for strip-like metallic plate
JPS5245720A (en) Electrical anticorrosion of external surface of bottom plate of surface tank
JPS57158395A (en) Method and apparatus for preventing plating on back side in electroplating
FR2565517B1 (fr) Groupe generateur pour la production d'energie electrique de courant continu, particulieremennt appropriee a l'alimentation de circuits pour le soudage electrique a l'arc
EP0271298A3 (fr) Appareillage pour réaction électrolytique
JPS5690998A (en) Barrel plating apparatus
JPS57126999A (en) Electrolytic treatment of strip like metal plate
JPS5651591A (en) Production of electroplated wire
JPS54159341A (en) Plating method
JPS52149295A (en) Protecting method for electrolytic bath
JPS565993A (en) Electric circuit of improved electrolytic bath
JPS5620200A (en) Purifying method for surface of continuous body of copper or copper alloy
JPS52106309A (en) Control of alumina supplying for aluminum electrolytic cell
JPS56126478A (en) Surfacing separation tank
JPS54161546A (en) Partially plating method
JPS53141180A (en) Electrolytic device