JPS5753828A - Production of magnetic recording medium - Google Patents

Production of magnetic recording medium

Info

Publication number
JPS5753828A
JPS5753828A JP12945980A JP12945980A JPS5753828A JP S5753828 A JPS5753828 A JP S5753828A JP 12945980 A JP12945980 A JP 12945980A JP 12945980 A JP12945980 A JP 12945980A JP S5753828 A JPS5753828 A JP S5753828A
Authority
JP
Japan
Prior art keywords
substrate
recording medium
high frequency
electrode
alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12945980A
Other languages
Japanese (ja)
Inventor
Masanori Sakamoto
Masataka Miyamura
Yuko Fujiwara
Masayuki Sunai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP12945980A priority Critical patent/JPS5753828A/en
Publication of JPS5753828A publication Critical patent/JPS5753828A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Thin Magnetic Films (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To obtain a magnetic recording medium suited to the vertically magnetized recording in a quick and stable way, by applying the AC voltage to a substrate when forming a recording medium layer made of a Co-Cr alloy on the substrate by an ion plating process. CONSTITUTION:The inert gas for discharge is led into a vacuum tank 1 after the tank 1 is evacuated, and then high frequency voltage is applied to a coil 5 from a high frequency power source for discharging 7 to perform glow discharge. Then the high frequency voltage is applied to an accelerating electrode 3 from a high frequency power source for accelerating 8. The particles of Co and Cr plus their alloy are evaporated from evaporating sources 2a and 2b. Thus a Co-Cr alloy thin film is formed on a substrate 4 that is supported by the electrode 3. As a result, the electrifying phenomenon which is easily caused when a substrate made of an insulated material is used can be liminated since an AC is applied to the electrode 3. Accordingly, the discharge occurring between the electrode 3 and the substrate 4 can be prevented to obtain a recording medium having reduced coarseness on its surface.
JP12945980A 1980-09-18 1980-09-18 Production of magnetic recording medium Pending JPS5753828A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12945980A JPS5753828A (en) 1980-09-18 1980-09-18 Production of magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12945980A JPS5753828A (en) 1980-09-18 1980-09-18 Production of magnetic recording medium

Publications (1)

Publication Number Publication Date
JPS5753828A true JPS5753828A (en) 1982-03-31

Family

ID=15010007

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12945980A Pending JPS5753828A (en) 1980-09-18 1980-09-18 Production of magnetic recording medium

Country Status (1)

Country Link
JP (1) JPS5753828A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59155478A (en) * 1983-02-03 1984-09-04 Japan Synthetic Rubber Co Ltd thermoplastic elastic tape

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59155478A (en) * 1983-02-03 1984-09-04 Japan Synthetic Rubber Co Ltd thermoplastic elastic tape

Similar Documents

Publication Publication Date Title
US4399013A (en) Method of producing a magnetic recording medium
US4002546A (en) Method for producing a magnetic recording medium
JPS5753828A (en) Production of magnetic recording medium
EP0035894A1 (en) Process for producing a magnetic recording medium
JPS54141111A (en) Method and apparatus for production of magnetic recording medium
JPS6143427A (en) Sputter-etching method
JPS5511127A (en) Forming method for oxidation film
JPS5671831A (en) Manufacture for magnetic recording medium
JPH0784659B2 (en) Sputtering target
JPS5743986A (en) Film forming apparatus
JPS58199862A (en) Magnetron type sputtering device
JPS56121629A (en) Film forming method
JPS578441A (en) Production of ion selective electrode
JPS63307272A (en) Ion beam sputtering device
JPS56165933A (en) Production of magnetic recording body
JPS5669809A (en) Magnetic material and its manufacture
JPS5674836A (en) Production of magnetic recording medium
JPS55148769A (en) Magnetron type sputtering apparatus
JPS6046370A (en) Opposed target type sputtering apparatus
JPS54125006A (en) Production of magnetic recording media
JPS59129944A (en) Method and device for manufacturing magnetic recording medium
JPS6188511A (en) Manufacture of magnetic thin film
JPS5966045A (en) surface modification equipment
JPS5591971A (en) Thin film forming method
JPS5778941A (en) Method and apparatus for plasma deposition