JPS5765376A - Electrochemical control for working liquid - Google Patents

Electrochemical control for working liquid

Info

Publication number
JPS5765376A
JPS5765376A JP14051580A JP14051580A JPS5765376A JP S5765376 A JPS5765376 A JP S5765376A JP 14051580 A JP14051580 A JP 14051580A JP 14051580 A JP14051580 A JP 14051580A JP S5765376 A JPS5765376 A JP S5765376A
Authority
JP
Japan
Prior art keywords
liquid
value
working
plating solution
vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14051580A
Other languages
Japanese (ja)
Inventor
Toshiki Sasabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP14051580A priority Critical patent/JPS5765376A/en
Publication of JPS5765376A publication Critical patent/JPS5765376A/en
Pending legal-status Critical Current

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  • Chemically Coating (AREA)

Abstract

PURPOSE: To accurately detect the concentration of a component in working liquid such as a plating solution or an etching solution with an electrochemical element under a stable condition, when the working liquid is controlled, by making the pressure of the liquid in contact with the element lower than the internal pressure of a reference electrode.
CONSTITUTION: Working liquid 12, e.g. a chemical copper plating solution, in a working vessel 11 is sucked through an electrochemical detection element 14 and returned into the working vessel 11 by a quantitative pump 15. Thus, the working liquid is circulated. In this case, the pH value of the plating solution is detected with the element 14. The detected value is introduced into a controller 16, amplified and compared with a preset pH value. Another quantitative pump 17 is driven with the comparison value, and an aqueous NaOH solution in a supplemental liquid vessel 18 is added as supplemental liquid 19 to the plating solution in the working vessel 11 to hold the pH value of the plating solution at a fixed level. In this case, the element 14 is constructed by an indication electrode such as a glass electrode and a reference electrode such as a silver-silver chloride electrode, and located at the suction side of the quantitative pump 15 so that liquid in contact with the element is constantly maintained in a pressure-reduced state. Consequently, the pH value can be accurately detected at any moment, and components in the liquid can be controlled under a stable condition.
COPYRIGHT: (C)1982,JPO&Japio
JP14051580A 1980-10-09 1980-10-09 Electrochemical control for working liquid Pending JPS5765376A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14051580A JPS5765376A (en) 1980-10-09 1980-10-09 Electrochemical control for working liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14051580A JPS5765376A (en) 1980-10-09 1980-10-09 Electrochemical control for working liquid

Publications (1)

Publication Number Publication Date
JPS5765376A true JPS5765376A (en) 1982-04-20

Family

ID=15270439

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14051580A Pending JPS5765376A (en) 1980-10-09 1980-10-09 Electrochemical control for working liquid

Country Status (1)

Country Link
JP (1) JPS5765376A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53109691A (en) * 1977-03-07 1978-09-25 Hitachi Ltd Flow cell type analysis method and apparatus liquid for specimen
JPS54106292A (en) * 1978-02-08 1979-08-21 Hitachi Ltd Liquid sample analyzer
JPS5546180A (en) * 1978-09-29 1980-03-31 Toa Denpa Kogyo Kk Measuring system of concentration of solution

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53109691A (en) * 1977-03-07 1978-09-25 Hitachi Ltd Flow cell type analysis method and apparatus liquid for specimen
JPS54106292A (en) * 1978-02-08 1979-08-21 Hitachi Ltd Liquid sample analyzer
JPS5546180A (en) * 1978-09-29 1980-03-31 Toa Denpa Kogyo Kk Measuring system of concentration of solution

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