JPS5765376A - Electrochemical control for working liquid - Google Patents
Electrochemical control for working liquidInfo
- Publication number
- JPS5765376A JPS5765376A JP14051580A JP14051580A JPS5765376A JP S5765376 A JPS5765376 A JP S5765376A JP 14051580 A JP14051580 A JP 14051580A JP 14051580 A JP14051580 A JP 14051580A JP S5765376 A JPS5765376 A JP S5765376A
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- value
- working
- plating solution
- vessel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 title abstract 10
- 238000007747 plating Methods 0.000 abstract 5
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract 3
- 230000000153 supplemental effect Effects 0.000 abstract 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- GTKRFUAGOKINCA-UHFFFAOYSA-M chlorosilver;silver Chemical compound [Ag].[Ag]Cl GTKRFUAGOKINCA-UHFFFAOYSA-M 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
- 238000000835 electrochemical detection Methods 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Landscapes
- Chemically Coating (AREA)
Abstract
PURPOSE: To accurately detect the concentration of a component in working liquid such as a plating solution or an etching solution with an electrochemical element under a stable condition, when the working liquid is controlled, by making the pressure of the liquid in contact with the element lower than the internal pressure of a reference electrode.
CONSTITUTION: Working liquid 12, e.g. a chemical copper plating solution, in a working vessel 11 is sucked through an electrochemical detection element 14 and returned into the working vessel 11 by a quantitative pump 15. Thus, the working liquid is circulated. In this case, the pH value of the plating solution is detected with the element 14. The detected value is introduced into a controller 16, amplified and compared with a preset pH value. Another quantitative pump 17 is driven with the comparison value, and an aqueous NaOH solution in a supplemental liquid vessel 18 is added as supplemental liquid 19 to the plating solution in the working vessel 11 to hold the pH value of the plating solution at a fixed level. In this case, the element 14 is constructed by an indication electrode such as a glass electrode and a reference electrode such as a silver-silver chloride electrode, and located at the suction side of the quantitative pump 15 so that liquid in contact with the element is constantly maintained in a pressure-reduced state. Consequently, the pH value can be accurately detected at any moment, and components in the liquid can be controlled under a stable condition.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14051580A JPS5765376A (en) | 1980-10-09 | 1980-10-09 | Electrochemical control for working liquid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14051580A JPS5765376A (en) | 1980-10-09 | 1980-10-09 | Electrochemical control for working liquid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5765376A true JPS5765376A (en) | 1982-04-20 |
Family
ID=15270439
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14051580A Pending JPS5765376A (en) | 1980-10-09 | 1980-10-09 | Electrochemical control for working liquid |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5765376A (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53109691A (en) * | 1977-03-07 | 1978-09-25 | Hitachi Ltd | Flow cell type analysis method and apparatus liquid for specimen |
| JPS54106292A (en) * | 1978-02-08 | 1979-08-21 | Hitachi Ltd | Liquid sample analyzer |
| JPS5546180A (en) * | 1978-09-29 | 1980-03-31 | Toa Denpa Kogyo Kk | Measuring system of concentration of solution |
-
1980
- 1980-10-09 JP JP14051580A patent/JPS5765376A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53109691A (en) * | 1977-03-07 | 1978-09-25 | Hitachi Ltd | Flow cell type analysis method and apparatus liquid for specimen |
| JPS54106292A (en) * | 1978-02-08 | 1979-08-21 | Hitachi Ltd | Liquid sample analyzer |
| JPS5546180A (en) * | 1978-09-29 | 1980-03-31 | Toa Denpa Kogyo Kk | Measuring system of concentration of solution |
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