JPS5772345A - Semiconductor integrated circuit - Google Patents
Semiconductor integrated circuitInfo
- Publication number
- JPS5772345A JPS5772345A JP55148399A JP14839980A JPS5772345A JP S5772345 A JPS5772345 A JP S5772345A JP 55148399 A JP55148399 A JP 55148399A JP 14839980 A JP14839980 A JP 14839980A JP S5772345 A JPS5772345 A JP S5772345A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- impurity concentration
- adjoins
- ohmic contact
- semiconductor layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W15/00—Highly-doped buried regions of integrated devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W15/00—Highly-doped buried regions of integrated devices
- H10W15/01—Manufacture or treatment
Landscapes
- Element Separation (AREA)
- Bipolar Integrated Circuits (AREA)
- Bipolar Transistors (AREA)
- Thyristors (AREA)
Abstract
PURPOSE:To integrate a high pressure resistance circuit element and a low resistance circuit element simultaneously, by providing a high impurity concentration layer, which adjoins a dielectric film, and a medium impurity concentration semiconductor layer between the layer and an adjoining semiconductor layer. CONSTITUTION:Between a high impurity concentration layer n<+>, which adjoins a dielectric film, and a semiconductor layer nB or nC, which adjoins the layer n<+>, a semiconductor layer n, whose impurity concentration is medium between those of the two layers, is formed. In an island region 11, a wiring 20 makes ohmic contact with the layer n and wirings 17-19 do not make ohmic contact, and therefore, the layer n becomes a field alleviating layer and the layer n<+> functions as a channel stopper. In an island region 12, a wiring 23 of a collector terminal makes ohmic contact with the layer n, and current passes to the layer n<+>, the layer n and the layer nC. The layer nC is made thinner by thickness of the layer n, and specific resistance of the layer n is lower, and therefore, saturation resistance of a transistor made in the region 12 is reduced.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55148399A JPS5772345A (en) | 1980-10-24 | 1980-10-24 | Semiconductor integrated circuit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55148399A JPS5772345A (en) | 1980-10-24 | 1980-10-24 | Semiconductor integrated circuit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5772345A true JPS5772345A (en) | 1982-05-06 |
| JPH0214781B2 JPH0214781B2 (en) | 1990-04-10 |
Family
ID=15451908
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55148399A Granted JPS5772345A (en) | 1980-10-24 | 1980-10-24 | Semiconductor integrated circuit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5772345A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007201202A (en) * | 2006-01-26 | 2007-08-09 | Toyota Central Res & Dev Lab Inc | Semiconductor device for electrostatic protection |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0397880U (en) * | 1990-01-26 | 1991-10-09 |
-
1980
- 1980-10-24 JP JP55148399A patent/JPS5772345A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007201202A (en) * | 2006-01-26 | 2007-08-09 | Toyota Central Res & Dev Lab Inc | Semiconductor device for electrostatic protection |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0214781B2 (en) | 1990-04-10 |
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