JPS5772380A - Mis type semiconductor device - Google Patents
Mis type semiconductor deviceInfo
- Publication number
- JPS5772380A JPS5772380A JP55149205A JP14920580A JPS5772380A JP S5772380 A JPS5772380 A JP S5772380A JP 55149205 A JP55149205 A JP 55149205A JP 14920580 A JP14920580 A JP 14920580A JP S5772380 A JPS5772380 A JP S5772380A
- Authority
- JP
- Japan
- Prior art keywords
- film
- onto
- silicon film
- shaped
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/01—Manufacture or treatment
- H10D64/011—Manufacture or treatment of electrodes ohmically coupled to a semiconductor
Landscapes
- Electrodes Of Semiconductors (AREA)
Abstract
PURPOSE:To shorten dimensions required as the semiconductor device largely by decreasing the positioning processes with eyes of a photo-mask. CONSTITUTION:An oxide film 2 and a nitride film 3 are formed onto a P type silicon substrate 1. A photo-resist is applied onto the nitride film 3, a mask is contacted, and a section corresponding to a section except an electrode forming section 5 is removed. A thermally oxidized SiO2 film 4 is shaped as an isolation film. A silicon film 6 is formed through a CVD method, and a polycrystal silicon film 6a is shaped onto the oxide film 4 and a single crystal silicon film 6c onto the electrode forming section 5. An oxide film 7 and a silicon film 8 are molded onto the silicon film 6, and a gate electrode 8 is formed. The polycrystal silicon film connected to a source region 9 and a drain region 10 is removed selectively, electrodes 9a, 10a are shaped, and a protective film 11 and a contact hole 12 are molded.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55149205A JPS5772380A (en) | 1980-10-24 | 1980-10-24 | Mis type semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55149205A JPS5772380A (en) | 1980-10-24 | 1980-10-24 | Mis type semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5772380A true JPS5772380A (en) | 1982-05-06 |
Family
ID=15470115
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55149205A Pending JPS5772380A (en) | 1980-10-24 | 1980-10-24 | Mis type semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5772380A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58173603U (en) * | 1982-05-17 | 1983-11-19 | 紀伊産業株式会社 | Inlet structure of simple garbage container |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5730372A (en) * | 1980-07-31 | 1982-02-18 | Fujitsu Ltd | Semiconductor device |
-
1980
- 1980-10-24 JP JP55149205A patent/JPS5772380A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5730372A (en) * | 1980-07-31 | 1982-02-18 | Fujitsu Ltd | Semiconductor device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58173603U (en) * | 1982-05-17 | 1983-11-19 | 紀伊産業株式会社 | Inlet structure of simple garbage container |
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