JPS5774370A - High-purity silica-forming coating solution - Google Patents
High-purity silica-forming coating solutionInfo
- Publication number
- JPS5774370A JPS5774370A JP9171781A JP9171781A JPS5774370A JP S5774370 A JPS5774370 A JP S5774370A JP 9171781 A JP9171781 A JP 9171781A JP 9171781 A JP9171781 A JP 9171781A JP S5774370 A JPS5774370 A JP S5774370A
- Authority
- JP
- Japan
- Prior art keywords
- halogenosilane
- alkoxysilane
- aryl
- halogen
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011248 coating agent Substances 0.000 title abstract 3
- 238000000576 coating method Methods 0.000 title abstract 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract 2
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- 125000003118 aryl group Chemical group 0.000 abstract 2
- 150000001735 carboxylic acids Chemical class 0.000 abstract 2
- 239000007795 chemical reaction product Substances 0.000 abstract 2
- 229910052736 halogen Inorganic materials 0.000 abstract 2
- 125000005843 halogen group Chemical group 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 abstract 1
- 230000002378 acidificating effect Effects 0.000 abstract 1
- 239000003957 anion exchange resin Substances 0.000 abstract 1
- 239000003054 catalyst Substances 0.000 abstract 1
- 239000003729 cation exchange resin Substances 0.000 abstract 1
- QEHKWLKYFXJVLL-UHFFFAOYSA-N dichloro(dimethoxy)silane Chemical compound CO[Si](Cl)(Cl)OC QEHKWLKYFXJVLL-UHFFFAOYSA-N 0.000 abstract 1
- 125000005417 glycidoxyalkyl group Chemical group 0.000 abstract 1
- 239000003456 ion exchange resin Substances 0.000 abstract 1
- 229920003303 ion-exchange polymer Polymers 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000002994 raw material Substances 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
Landscapes
- Paints Or Removers (AREA)
- Silicon Polymers (AREA)
Abstract
PURPOSE: To provide the titled coating soln. having excellent corrosionproofness and suitable as a raw material for the production of an insulating film for electronic parts, by treating a reaction product between a halogenosilane or an alkoxysilane and a carboxylic acid or water with ion exchange resins.
CONSTITUTION: One mol of a halogenosilane of formulaI(wherein X is halogen; R is alkyl or aryl; n is 0W3) such as trimethyltrichlorosilane or an alkoxysilane of formula II (wherein X is halogen; R' is alkyl, aryl or glycidoxyalkyl; n is 0W4) such as dimethoxydichlorosilane, is reacted with 2W8mol of a carboxylic acid such as acetic acid or water in the presence of a catalyst such as hydrochloric acid and in an org. solvent. The reaction product is treated with a basic anion exchange resin, and then with a strongly acidic cation exchange resin to produce the desired coating soln.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9171781A JPS5774370A (en) | 1981-06-15 | 1981-06-15 | High-purity silica-forming coating solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9171781A JPS5774370A (en) | 1981-06-15 | 1981-06-15 | High-purity silica-forming coating solution |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11439879A Division JPS5638362A (en) | 1979-09-06 | 1979-09-06 | Preparation of coating solution for formation of high- purity silica film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5774370A true JPS5774370A (en) | 1982-05-10 |
Family
ID=14034255
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9171781A Pending JPS5774370A (en) | 1981-06-15 | 1981-06-15 | High-purity silica-forming coating solution |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5774370A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5958053A (en) * | 1982-09-29 | 1984-04-03 | Fujitsu Ltd | Silicone resin solution and its preparation |
| JPS5958054A (en) * | 1982-09-29 | 1984-04-03 | Fujitsu Ltd | Silicone resin solution and its preparation |
| JPH04226572A (en) * | 1990-06-29 | 1992-08-17 | Ppg Ind Inc | Hardwearing coating material composition and production thereof |
| US5300628A (en) * | 1992-06-29 | 1994-04-05 | Ocg Microelectronic Materials, Inc. | Selected chelate resins and their use to remove multivalent metal impurities from resist components |
| US5446125A (en) * | 1991-04-01 | 1995-08-29 | Ocg Microelectronic Materials, Inc. | Method for removing metal impurities from resist components |
| US5446126A (en) * | 1991-04-01 | 1995-08-29 | Ocg Microelectronic Materials, Inc. | Method for removing metal impurities from resist components |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5638362A (en) * | 1979-09-06 | 1981-04-13 | Tokyo Denshi Kagaku Kabushiki | Preparation of coating solution for formation of high- purity silica film |
-
1981
- 1981-06-15 JP JP9171781A patent/JPS5774370A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5638362A (en) * | 1979-09-06 | 1981-04-13 | Tokyo Denshi Kagaku Kabushiki | Preparation of coating solution for formation of high- purity silica film |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5958053A (en) * | 1982-09-29 | 1984-04-03 | Fujitsu Ltd | Silicone resin solution and its preparation |
| JPS5958054A (en) * | 1982-09-29 | 1984-04-03 | Fujitsu Ltd | Silicone resin solution and its preparation |
| JPH04226572A (en) * | 1990-06-29 | 1992-08-17 | Ppg Ind Inc | Hardwearing coating material composition and production thereof |
| US5446125A (en) * | 1991-04-01 | 1995-08-29 | Ocg Microelectronic Materials, Inc. | Method for removing metal impurities from resist components |
| US5446126A (en) * | 1991-04-01 | 1995-08-29 | Ocg Microelectronic Materials, Inc. | Method for removing metal impurities from resist components |
| US5300628A (en) * | 1992-06-29 | 1994-04-05 | Ocg Microelectronic Materials, Inc. | Selected chelate resins and their use to remove multivalent metal impurities from resist components |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| AU2066688A (en) | Composition and process for conditioning the surface of polycarbonate resins prior to metal plating | |
| JPS5774370A (en) | High-purity silica-forming coating solution | |
| SE8205838L (en) | SET TO MANUFACTURE HYDRAULIZABLE POLYESTER RESINS AND LACKS AND COATING COMPOSITIONS CONTAINING THEM | |
| JPS5638362A (en) | Preparation of coating solution for formation of high- purity silica film | |
| GB1528221A (en) | Process for manufacturing enamels of polyester-polyimide resins particularly for coating electrical conductors | |
| JPS57192392A (en) | Production of 3-alkoxymethylcephalosporin | |
| CN109502566B (en) | Method for preparing zinc phosphate | |
| IL99203A0 (en) | Process for the preparation of aminomethylphosphonic acid and aminomethylphosphinic acids | |
| JPS5518474A (en) | Production of polyaminoacid | |
| EP0128693A3 (en) | Process for the preparation of 4-hydroxybenzophenones | |
| JPS5716877A (en) | Production of polyalkyl-2- 2,4-dihydroxyphenyl -7-hydroxy- chroman | |
| JPS5794003A (en) | Perfluorocarbon polymer and its production | |
| JPS54116082A (en) | Preparation of phenolic resin | |
| US3153006A (en) | Fluidizable catalysts containing monoorganosiloxane units and oxy-containing units derived from aluminum, boron, and tin | |
| JPS56159256A (en) | Polyalkyl silicate composition | |
| JPS6437409A (en) | Production of monetite | |
| SU1015653A1 (en) | Method of obtaining anion exchanger | |
| JPS5724636A (en) | Manufacture of molded zeolite adsorbent | |
| JPS56104852A (en) | Purification of aqueous solution of acrylamide | |
| US3150181A (en) | Purification of aromatic acids using zinc, aluminum, or magnesium | |
| JPS57118569A (en) | Novel imidazole-allantoin addition product and its preparation | |
| JPS5740493A (en) | Preparation of triorganosilyl carboxylate | |
| JPS5610530A (en) | Production of polybenzodipyrroledione | |
| JPS57176957A (en) | Preparation of 1-(2',6'-dichlorophenyl)-2-indolinone | |
| JPS56139488A (en) | Sesquiterpene compound and its preparation |