JPS5776542A - Material for forming pattern - Google Patents

Material for forming pattern

Info

Publication number
JPS5776542A
JPS5776542A JP15310780A JP15310780A JPS5776542A JP S5776542 A JPS5776542 A JP S5776542A JP 15310780 A JP15310780 A JP 15310780A JP 15310780 A JP15310780 A JP 15310780A JP S5776542 A JPS5776542 A JP S5776542A
Authority
JP
Japan
Prior art keywords
org
polymer substance
peroxide
copolymer
rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15310780A
Other languages
Japanese (ja)
Inventor
Tateo Kitamura
Yasuhiro Yoneda
Jiro Naito
Toshisuke Kitakoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15310780A priority Critical patent/JPS5776542A/en
Publication of JPS5776542A publication Critical patent/JPS5776542A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To enhance the sensitivity of an org. polymer substance without deteriorating the superior resolving power, dry etching resistance, etc. by adding org. peroxide to the substance which increase the mol.wt. by cross-linking when irradiated. CONSTITUTION:Org. peroxide is added to an org. polymer substance which increases the mol.wt. by cross-linking when irradiated with ionized radiation such as electron beams, X-rays, ion beams, gamma-rays of neutron beams. The applied org. polymer substance is a homo- or copolymer having an allyl group in each polymn. repeating unit such as polydiallyl orthophthalate or polytriallyl cyanurate, or a styrene homo- or copolymer or a deriv. thereof such as polystyrene, acrylonitrile- styrene copolymer or halogenated polystyrene. The preferred amount of the org. peroxide added to the org. polymer substance is about 0.01-20%.
JP15310780A 1980-10-31 1980-10-31 Material for forming pattern Pending JPS5776542A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15310780A JPS5776542A (en) 1980-10-31 1980-10-31 Material for forming pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15310780A JPS5776542A (en) 1980-10-31 1980-10-31 Material for forming pattern

Publications (1)

Publication Number Publication Date
JPS5776542A true JPS5776542A (en) 1982-05-13

Family

ID=15555118

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15310780A Pending JPS5776542A (en) 1980-10-31 1980-10-31 Material for forming pattern

Country Status (1)

Country Link
JP (1) JPS5776542A (en)

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