JPS5776542A - Material for forming pattern - Google Patents

Material for forming pattern

Info

Publication number
JPS5776542A
JPS5776542A JP15310780A JP15310780A JPS5776542A JP S5776542 A JPS5776542 A JP S5776542A JP 15310780 A JP15310780 A JP 15310780A JP 15310780 A JP15310780 A JP 15310780A JP S5776542 A JPS5776542 A JP S5776542A
Authority
JP
Japan
Prior art keywords
org
polymer substance
peroxide
copolymer
rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15310780A
Other languages
English (en)
Inventor
Tateo Kitamura
Yasuhiro Yoneda
Jiro Naito
Toshisuke Kitakoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15310780A priority Critical patent/JPS5776542A/ja
Publication of JPS5776542A publication Critical patent/JPS5776542A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP15310780A 1980-10-31 1980-10-31 Material for forming pattern Pending JPS5776542A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15310780A JPS5776542A (en) 1980-10-31 1980-10-31 Material for forming pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15310780A JPS5776542A (en) 1980-10-31 1980-10-31 Material for forming pattern

Publications (1)

Publication Number Publication Date
JPS5776542A true JPS5776542A (en) 1982-05-13

Family

ID=15555118

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15310780A Pending JPS5776542A (en) 1980-10-31 1980-10-31 Material for forming pattern

Country Status (1)

Country Link
JP (1) JPS5776542A (ja)

Similar Documents

Publication Publication Date Title
NO824165L (no) Patroner eller deres elementer av polyetylen
JPS574172A (en) Light conductive member
JPS5723694B2 (ja)
JPS5776542A (en) Material for forming pattern
ATE9588T1 (de) Verfahren zur herstellung von pfropfcopolymeren durch bestrahlung.
EP0130088A3 (en) Plasma developable negative resist compositions for electron beam, x-ray and optical lithography
US3442780A (en) Grafting of vinyl aromatic monomers onto polychlorotrifluoroethylene with irradiation
JPS5786832A (en) Pattern forming material
JPS5518673A (en) Ionized radiation sensitive negative type resist
JPS5778529A (en) Resist material
JPS5684748A (en) Radiation-resistant resin composition
NO163189C (no) Beleggssammensetnite fo hindre skallav setning ved polymerisasjon av en etylenisk umettet monomer
DE3060832D1 (en) Colourable, peroxide curable chlorinated polymer composition
JPS56110932A (en) Compound for negative type resist
JPS57159804A (en) Radiation-sensitive organic high-molecular material
JPS5260686A (en) X-ray photoelectronic analysis
OA06804A (fr) Tube accélérateur de neutrons à section d'ionisation très perfectionnée.
JPS5688134A (en) Positive type resist
DE68904421D1 (de) Dichtungsmasse.
JPS5390358A (en) Resin composition
JPS5684731A (en) Production of molding from flame-retarding high- molecular composition
Bordes et al. Eikonal corrections to hard processes
JPS56147144A (en) Negative type electron beam resist material
Yamanouti et al. 30a-GF-3 SCATTERING OF 24 MeV NEUTRONS FROM^< 58, 60> NI
JPS5390766A (en) Exposure method