JPS5776840A - Forming method of pattern - Google Patents

Forming method of pattern

Info

Publication number: JPS5776840A
Authority: JP; Japan
Prior art keywords: wafer; etching; forming part; pattern forming; pattern
Prior art date: 1980-10-31
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP15213280A

Other languages

English (en)

Inventor

Shinya Tominaga

Yasuyuki Mori

Teruo Tsukuda

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Victor Company of Japan Ltd

Nippon Victor KK

Original Assignee

Victor Company of Japan Ltd

Nippon Victor KK

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1980-10-31

Filing date

1980-10-31

Publication date

1982-05-14

1980-10-31 Application filed by Victor Company of Japan Ltd, Nippon Victor KK filed Critical Victor Company of Japan Ltd

1980-10-31 Priority to JP15213280A priority Critical patent/JPS5776840A/ja

1982-05-14 Publication of JPS5776840A publication Critical patent/JPS5776840A/ja

Status Pending legal-status Critical Current

Links

238000005530 etching Methods 0.000 abstract 3
230000005684 electric field Effects 0.000 abstract 2
229920002120 photoresistant polymer Polymers 0.000 abstract 2
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
235000012489 doughnuts Nutrition 0.000 abstract 1
239000000463 material Substances 0.000 abstract 1
230000002093 peripheral effect Effects 0.000 abstract 1
238000001020 plasma etching Methods 0.000 abstract 1
229910052710 silicon Inorganic materials 0.000 abstract 1
239000010703 silicon Substances 0.000 abstract 1
239000000758 substrate Substances 0.000 abstract 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Drying Of Semiconductors (AREA)

JP15213280A 1980-10-31 1980-10-31 Forming method of pattern Pending JPS5776840A (en)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP15213280A JPS5776840A (en)	1980-10-31	1980-10-31	Forming method of pattern

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP15213280A JPS5776840A (en)	1980-10-31	1980-10-31	Forming method of pattern

Publications (1)

Publication Number	Publication Date
JPS5776840A true JPS5776840A (en)	1982-05-14

Family

ID=15533743

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP15213280A Pending JPS5776840A (en)	1980-10-31	1980-10-31	Forming method of pattern

Country Status (1)

Country	Link
JP (1)	JPS5776840A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
WO1997027622A1 (fr) *	1996-01-26	1997-07-31	Matsushita Electronics Corporation	Appareil de fabrication de semiconducteurs

Citations (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS52137266A (en) *	1976-05-12	1977-11-16	Nichiden Varian Kk	Method of sputter etching

1980
- 1980-10-31 JP JP15213280A patent/JPS5776840A/ja active Pending

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS52137266A (en) *	1976-05-12	1977-11-16	Nichiden Varian Kk	Method of sputter etching

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
WO1997027622A1 (fr) *	1996-01-26	1997-07-31	Matsushita Electronics Corporation	Appareil de fabrication de semiconducteurs
US6214740B1 (en)	1996-01-26	2001-04-10	Matsushita Electronics Corporation	Semiconductor manufacturing apparatus

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