JPS5776843A - Device for processing microwave plasma - Google Patents

Device for processing microwave plasma

Info

Publication number
JPS5776843A
JPS5776843A JP15313080A JP15313080A JPS5776843A JP S5776843 A JPS5776843 A JP S5776843A JP 15313080 A JP15313080 A JP 15313080A JP 15313080 A JP15313080 A JP 15313080A JP S5776843 A JPS5776843 A JP S5776843A
Authority
JP
Japan
Prior art keywords
plasma
introducing pipe
gas
discharge tubes
gas introducing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15313080A
Other languages
Japanese (ja)
Other versions
JPH0313740B2 (en
Inventor
Hiroshi Yano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15313080A priority Critical patent/JPS5776843A/en
Publication of JPS5776843A publication Critical patent/JPS5776843A/en
Publication of JPH0313740B2 publication Critical patent/JPH0313740B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357Generation remote from the workpiece, e.g. down-stream

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To make it possible to machine a fine pattern with small gas pressure by arranging discharge tubes so as to enclose a gas introducing pipe at the upper and bottom surfaces of a waveguide. CONSTITUTION:The discharge tubes 10 are arranged on the upper and bottom surfaces of the wave guide 6 around the gas introducing pipe 2 which pierces through the wave guide 6. Since there is a fine gas between the wave guide 6 and the gas introducing pipe 2, the microwave is leaked from said gap. Then, discharge is caused in the discharge tubes 10, the discharge tubes 10 and lighted, and the plasma is generated in the gas introducing pipe 2. Said plasma is propagated along the gas stream in the direction at a right angle with a semiconductor wafer to be processed which is placed at the lower part. In this constitution, generation of the plasma is aided. Furthermore, since the plasma perpendicularly hits upon the wafer, accurate etching can be performed.
JP15313080A 1980-10-31 1980-10-31 Device for processing microwave plasma Granted JPS5776843A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15313080A JPS5776843A (en) 1980-10-31 1980-10-31 Device for processing microwave plasma

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15313080A JPS5776843A (en) 1980-10-31 1980-10-31 Device for processing microwave plasma

Publications (2)

Publication Number Publication Date
JPS5776843A true JPS5776843A (en) 1982-05-14
JPH0313740B2 JPH0313740B2 (en) 1991-02-25

Family

ID=15555636

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15313080A Granted JPS5776843A (en) 1980-10-31 1980-10-31 Device for processing microwave plasma

Country Status (1)

Country Link
JP (1) JPS5776843A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5314472A (en) * 1976-06-09 1978-02-09 Margraf Adolf Hose filter
JPS55122398A (en) * 1979-03-14 1980-09-20 Fusion Systems Corp Device for firing electrodeless discharge lamp

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5314472A (en) * 1976-06-09 1978-02-09 Margraf Adolf Hose filter
JPS55122398A (en) * 1979-03-14 1980-09-20 Fusion Systems Corp Device for firing electrodeless discharge lamp

Also Published As

Publication number Publication date
JPH0313740B2 (en) 1991-02-25

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