JPS5778042A - Method for printing of photomask - Google Patents

Method for printing of photomask

Info

Publication number
JPS5778042A
JPS5778042A JP15423080A JP15423080A JPS5778042A JP S5778042 A JPS5778042 A JP S5778042A JP 15423080 A JP15423080 A JP 15423080A JP 15423080 A JP15423080 A JP 15423080A JP S5778042 A JPS5778042 A JP S5778042A
Authority
JP
Japan
Prior art keywords
mask
pressure
masks
chambers
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15423080A
Other languages
English (en)
Inventor
Koji Kameda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP15423080A priority Critical patent/JPS5778042A/ja
Publication of JPS5778042A publication Critical patent/JPS5778042A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP15423080A 1980-10-31 1980-10-31 Method for printing of photomask Pending JPS5778042A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15423080A JPS5778042A (en) 1980-10-31 1980-10-31 Method for printing of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15423080A JPS5778042A (en) 1980-10-31 1980-10-31 Method for printing of photomask

Publications (1)

Publication Number Publication Date
JPS5778042A true JPS5778042A (en) 1982-05-15

Family

ID=15579687

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15423080A Pending JPS5778042A (en) 1980-10-31 1980-10-31 Method for printing of photomask

Country Status (1)

Country Link
JP (1) JPS5778042A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5996730A (ja) * 1982-11-26 1984-06-04 Hitachi Ltd マスクアライナ

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5996730A (ja) * 1982-11-26 1984-06-04 Hitachi Ltd マスクアライナ

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