JPS5779625A - Gettering of silicon wafer - Google Patents

Gettering of silicon wafer

Info

Publication number
JPS5779625A
JPS5779625A JP55156291A JP15629180A JPS5779625A JP S5779625 A JPS5779625 A JP S5779625A JP 55156291 A JP55156291 A JP 55156291A JP 15629180 A JP15629180 A JP 15629180A JP S5779625 A JPS5779625 A JP S5779625A
Authority
JP
Japan
Prior art keywords
silicon wafer
plasma
stacking faults
treatment
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55156291A
Other languages
English (en)
Inventor
Shinichi Konishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd, Sanyo Denki Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP55156291A priority Critical patent/JPS5779625A/ja
Publication of JPS5779625A publication Critical patent/JPS5779625A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/90—Thermal treatments, e.g. annealing or sintering

Landscapes

  • Drying Of Semiconductors (AREA)
JP55156291A 1980-11-05 1980-11-05 Gettering of silicon wafer Pending JPS5779625A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55156291A JPS5779625A (en) 1980-11-05 1980-11-05 Gettering of silicon wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55156291A JPS5779625A (en) 1980-11-05 1980-11-05 Gettering of silicon wafer

Publications (1)

Publication Number Publication Date
JPS5779625A true JPS5779625A (en) 1982-05-18

Family

ID=15624593

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55156291A Pending JPS5779625A (en) 1980-11-05 1980-11-05 Gettering of silicon wafer

Country Status (1)

Country Link
JP (1) JPS5779625A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59103348A (ja) * 1982-12-06 1984-06-14 Toyota Central Res & Dev Lab Inc 半導体装置の製造方法
JPS6047426A (ja) * 1983-08-26 1985-03-14 Komatsu Denshi Kinzoku Kk Ｂｓｄ付与半導体基板
KR100405015B1 (ko) * 1999-09-10 2003-11-07 가부시끼가이샤 도시바 반도체 장치의 제조 방법

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5051665A (ja) * 1973-09-07 1975-05-08
JPS5362474A (en) * 1976-11-17 1978-06-03 Hitachi Ltd Cleaning method of metal photo mask

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5051665A (ja) * 1973-09-07 1975-05-08
JPS5362474A (en) * 1976-11-17 1978-06-03 Hitachi Ltd Cleaning method of metal photo mask

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59103348A (ja) * 1982-12-06 1984-06-14 Toyota Central Res & Dev Lab Inc 半導体装置の製造方法
JPS6047426A (ja) * 1983-08-26 1985-03-14 Komatsu Denshi Kinzoku Kk Ｂｓｄ付与半導体基板
KR100405015B1 (ko) * 1999-09-10 2003-11-07 가부시끼가이샤 도시바 반도체 장치의 제조 방법

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