JPS5779680A - Manufacture of silicon avalanche photodiode - Google Patents

Manufacture of silicon avalanche photodiode

Info

Publication number
JPS5779680A
JPS5779680A JP55156088A JP15608880A JPS5779680A JP S5779680 A JPS5779680 A JP S5779680A JP 55156088 A JP55156088 A JP 55156088A JP 15608880 A JP15608880 A JP 15608880A JP S5779680 A JPS5779680 A JP S5779680A
Authority
JP
Japan
Prior art keywords
type
layer
manufacture
covered
single crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55156088A
Other languages
English (en)
Inventor
Seiichi Nagai
Saburo Takamiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP55156088A priority Critical patent/JPS5779680A/ja
Publication of JPS5779680A publication Critical patent/JPS5779680A/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • H10F30/21Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
    • H10F30/22Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
    • H10F30/225Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier working in avalanche mode, e.g. avalanche photodiodes

Landscapes

  • Light Receiving Elements (AREA)
JP55156088A 1980-11-05 1980-11-05 Manufacture of silicon avalanche photodiode Pending JPS5779680A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55156088A JPS5779680A (en) 1980-11-05 1980-11-05 Manufacture of silicon avalanche photodiode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55156088A JPS5779680A (en) 1980-11-05 1980-11-05 Manufacture of silicon avalanche photodiode

Publications (1)

Publication Number Publication Date
JPS5779680A true JPS5779680A (en) 1982-05-18

Family

ID=15620034

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55156088A Pending JPS5779680A (en) 1980-11-05 1980-11-05 Manufacture of silicon avalanche photodiode

Country Status (1)

Country Link
JP (1) JPS5779680A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4606115A (en) * 1985-05-14 1986-08-19 Motorola, Inc. Method of manufacturing optically sensitive semiconductor devices including anti-reflective coatings

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4606115A (en) * 1985-05-14 1986-08-19 Motorola, Inc. Method of manufacturing optically sensitive semiconductor devices including anti-reflective coatings

Similar Documents

Publication Publication Date Title
JPS5710992A (en) Semiconductor device and manufacture therefor
JPS55115376A (en) Semiconductor device and manufacturing thereof
JPS5331964A (en) Production of semiconductor substrates
JPS5721875A (en) Photosensor
JPS53148394A (en) Manufacture of semiconductor device
JPS52124887A (en) Solar battery
JPS57204115A (en) Manufacture of semiconductor device
JPS54101278A (en) Manufacture for semiconductor device
JPS57128943A (en) Insulation isolated semiconductor integrated device and manufacture thereof
JPS645002A (en) Temperature detector
JPS5282087A (en) Production of solar cell
JPS5329668A (en) Production of semiconductor device
JPS5336180A (en) Production of semiconductor device
JPS5325350A (en) Dicing method of semiconductor substrates
JPS5617076A (en) Manufacture of semiconductor device
JPS5710987A (en) Silicon avalanche photo diode
JPS54149486A (en) Pressure-sensitive element
JPS5317286A (en) Production of semiconductor device
JPS5731171A (en) Semiconductor device
JPS542658A (en) Semiconductor device and its manufacture
JPS5651829A (en) Glassivating method for bevel-type semiconductor element
NL7705730A (en) Target plate sensitive to radiation - is for TV tube and uses single process doping one face of silicon disc and removing material from other side
JPS53117963A (en) Production of semiconductor device
JPS55143049A (en) Manufacture of semiconductor element
JPS5496984A (en) Semiconductor laser device