JPS5780754A - Integrated circuit - Google Patents
Integrated circuitInfo
- Publication number
- JPS5780754A JPS5780754A JP55155923A JP15592380A JPS5780754A JP S5780754 A JPS5780754 A JP S5780754A JP 55155923 A JP55155923 A JP 55155923A JP 15592380 A JP15592380 A JP 15592380A JP S5780754 A JPS5780754 A JP S5780754A
- Authority
- JP
- Japan
- Prior art keywords
- resistors
- resistor
- base diffusion
- bias
- supplying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/201—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits
- H10D84/204—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors
- H10D84/206—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors of combinations of capacitors and resistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
- H10D84/611—Combinations of BJTs and one or more of diodes, resistors or capacitors
- H10D84/613—Combinations of vertical BJTs and one or more of diodes, resistors or capacitors
Landscapes
- Bipolar Transistors (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE:To largely rduce the capacity of an input coupling capacitor by using a resistor for supplying a DC bias as an ion injection resistor. CONSTITUTION:Resistors R1, R2 for supplying DC bias are used as ion injection resistors, the input resistance is remarkably increased, and the capacity of the input coupling capacitor 10 is decreased inversely proportional threto. The inconvenience when the input resistance is enhanced is the feasibility of the influence of the DC amplification factor hFE and the deterioration of the frequency characteristics due to mirror effect, but can be solved by driving a differential amplifier of transistors (TR) Q5, Q6 by emitter followers TRQ1, Q2. In this circuit, the resistances of the resistors R5-R7, R10 are small, and the base diffusion resistance is accordingly used. The resistor loads R8, R9 are necessarily formed in base diffusion. This is necessary because the resistors R6, R7 are base diffusion resistors to suppress the iregularity in the gain.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55155923A JPS5780754A (en) | 1980-11-07 | 1980-11-07 | Integrated circuit |
| US06/721,132 US4689579A (en) | 1980-11-07 | 1985-04-08 | Analog integrated circuit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55155923A JPS5780754A (en) | 1980-11-07 | 1980-11-07 | Integrated circuit |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5780754A true JPS5780754A (en) | 1982-05-20 |
Family
ID=15616457
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55155923A Pending JPS5780754A (en) | 1980-11-07 | 1980-11-07 | Integrated circuit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5780754A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4689579A (en) * | 1980-11-07 | 1987-08-25 | Hitachi, Ltd. | Analog integrated circuit |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50157060A (en) * | 1974-06-07 | 1975-12-18 | ||
| JPS5342576A (en) * | 1976-09-29 | 1978-04-18 | Nec Corp | Production of semiconductor device |
-
1980
- 1980-11-07 JP JP55155923A patent/JPS5780754A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50157060A (en) * | 1974-06-07 | 1975-12-18 | ||
| JPS5342576A (en) * | 1976-09-29 | 1978-04-18 | Nec Corp | Production of semiconductor device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4689579A (en) * | 1980-11-07 | 1987-08-25 | Hitachi, Ltd. | Analog integrated circuit |
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