JPS5789220A - Positioning method and marking for positioning - Google Patents

Positioning method and marking for positioning

Info

Publication number
JPS5789220A
JPS5789220A JP55164560A JP16456080A JPS5789220A JP S5789220 A JPS5789220 A JP S5789220A JP 55164560 A JP55164560 A JP 55164560A JP 16456080 A JP16456080 A JP 16456080A JP S5789220 A JPS5789220 A JP S5789220A
Authority
JP
Japan
Prior art keywords
positioning
electron beam
marking
pair
center position
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55164560A
Other languages
Japanese (ja)
Inventor
Fumio Mizuno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP55164560A priority Critical patent/JPS5789220A/en
Publication of JPS5789220A publication Critical patent/JPS5789220A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

PURPOSE:To enable positioning for a substrate with an electron beam scan in only one direction, by providing a means forming a positioning mark from a pair of marking patterns opposite to the scanning direction of electron beam. CONSTITUTION:An outer sides of a pair of marking patterns opposite each other in a minute interval are nonparallel to the scanning direction. A mark is formed so that the width of scanning direction equals at the marking center. A means is provided to detect the center position by the scanning of electron beam. For instance, a positioning mark 4 has a pair of marking patterns 6, 7 arranged in a minute interval 5 opposite each other to the X-direction. The inner sides 8, 9 are set parallel to the Y-direction. The outer sides 10, 11 are inclined and parallel with each other. The widths l6, l7 are made equal at the center position. The center position 12 is obtained by moving electron beam in the Y-direction for the purpose of detection.
JP55164560A 1980-11-25 1980-11-25 Positioning method and marking for positioning Pending JPS5789220A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55164560A JPS5789220A (en) 1980-11-25 1980-11-25 Positioning method and marking for positioning

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55164560A JPS5789220A (en) 1980-11-25 1980-11-25 Positioning method and marking for positioning

Publications (1)

Publication Number Publication Date
JPS5789220A true JPS5789220A (en) 1982-06-03

Family

ID=15795476

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55164560A Pending JPS5789220A (en) 1980-11-25 1980-11-25 Positioning method and marking for positioning

Country Status (1)

Country Link
JP (1) JPS5789220A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4782288A (en) * 1985-12-31 1988-11-01 Sgs Microelettronica S.P.A. Method for evaluating processing parameters in the manufacture of semiconductor devices

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4782288A (en) * 1985-12-31 1988-11-01 Sgs Microelettronica S.P.A. Method for evaluating processing parameters in the manufacture of semiconductor devices

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