JPS55150228A - Method of detecting position of electron beam - Google Patents

Method of detecting position of electron beam

Info

Publication number
JPS55150228A
JPS55150228A JP5726779A JP5726779A JPS55150228A JP S55150228 A JPS55150228 A JP S55150228A JP 5726779 A JP5726779 A JP 5726779A JP 5726779 A JP5726779 A JP 5726779A JP S55150228 A JPS55150228 A JP S55150228A
Authority
JP
Japan
Prior art keywords
electron beam
mark
film
pattern
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5726779A
Other languages
Japanese (ja)
Inventor
Masaki Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP5726779A priority Critical patent/JPS55150228A/en
Publication of JPS55150228A publication Critical patent/JPS55150228A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To position thereafter an electron beam in high speed and accuracy by forming a positional reference mark in addition to an element pattern formed on a substrate when detecting the position of an electron beam, perforating an opening corresponding to the mark on a resist film coated thereon and using the exposed mark as a reference. CONSTITUTION:An element pattern 52 is formed on a substrate 51, an electron resist film 54 is coated on the entire surface thereof, and when an electron beam is irradiated to predetermined position of the film 54, a positional reference mark 53 is formed at predetermined distance from the pattern 52 in addition to the pattern 52 on the substrate 51. Then, the film 54 is coated on the entire surface, a light A is exposed on the film 54 corresponding to the mark 53, the film 54 is developed to form an opening 55, and only the mark 52 is exposed. Thereafter, the electron beam 56 is scanned in the opening 55 to detect the relative position between the electron beam 56 and the mark 53, the positional relationship between the pattern 52 and the electron beam 56 is identified on the basis of the detection, and the electron beam is thereafter irradiated thereto.
JP5726779A 1979-05-10 1979-05-10 Method of detecting position of electron beam Pending JPS55150228A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5726779A JPS55150228A (en) 1979-05-10 1979-05-10 Method of detecting position of electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5726779A JPS55150228A (en) 1979-05-10 1979-05-10 Method of detecting position of electron beam

Publications (1)

Publication Number Publication Date
JPS55150228A true JPS55150228A (en) 1980-11-22

Family

ID=13050747

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5726779A Pending JPS55150228A (en) 1979-05-10 1979-05-10 Method of detecting position of electron beam

Country Status (1)

Country Link
JP (1) JPS55150228A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5534430A (en) * 1978-08-31 1980-03-11 Fujitsu Ltd Positioning method in electron beam exposure

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5534430A (en) * 1978-08-31 1980-03-11 Fujitsu Ltd Positioning method in electron beam exposure

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