JPS57968B2 - - Google Patents
Info
- Publication number
- JPS57968B2 JPS57968B2 JP4478576A JP4478576A JPS57968B2 JP S57968 B2 JPS57968 B2 JP S57968B2 JP 4478576 A JP4478576 A JP 4478576A JP 4478576 A JP4478576 A JP 4478576A JP S57968 B2 JPS57968 B2 JP S57968B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4478576A JPS52128132A (en) | 1976-04-20 | 1976-04-20 | Positive type electron beam sensitive composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4478576A JPS52128132A (en) | 1976-04-20 | 1976-04-20 | Positive type electron beam sensitive composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52128132A JPS52128132A (en) | 1977-10-27 |
| JPS57968B2 true JPS57968B2 (ja) | 1982-01-08 |
Family
ID=12701052
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4478576A Granted JPS52128132A (en) | 1976-04-20 | 1976-04-20 | Positive type electron beam sensitive composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52128132A (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02297883A (ja) * | 1989-01-26 | 1990-12-10 | Teledyne Inc | 電流制御を改善した印刷配線板 |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5622429A (en) * | 1979-08-01 | 1981-03-03 | Agency Of Ind Science & Technol | Photosensitive resin composition |
| JPS5677843A (en) * | 1979-11-30 | 1981-06-26 | Fujitsu Ltd | Resist pattern forming method |
| JPS56137347A (en) * | 1980-03-29 | 1981-10-27 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition for dry development |
| JPS5852634A (ja) * | 1981-09-25 | 1983-03-28 | Tokyo Ohka Kogyo Co Ltd | ネガ型微細パターン形成方法 |
| JPS58114033A (ja) * | 1981-12-28 | 1983-07-07 | Fujitsu Ltd | パタ−ン形成方法 |
| JPS6070442A (ja) * | 1983-09-28 | 1985-04-22 | Fujitsu Ltd | パタ−ン形成方法 |
| JPH0499373U (ja) * | 1991-01-16 | 1992-08-27 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1445345A (en) * | 1972-12-21 | 1976-08-11 | Mullard Ltd | Positive-working electron resists |
-
1976
- 1976-04-20 JP JP4478576A patent/JPS52128132A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02297883A (ja) * | 1989-01-26 | 1990-12-10 | Teledyne Inc | 電流制御を改善した印刷配線板 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS52128132A (en) | 1977-10-27 |