JPS5798846A - X-ray diffractometer - Google Patents

X-ray diffractometer

Info

Publication number
JPS5798846A
JPS5798846A JP55175164A JP17516480A JPS5798846A JP S5798846 A JPS5798846 A JP S5798846A JP 55175164 A JP55175164 A JP 55175164A JP 17516480 A JP17516480 A JP 17516480A JP S5798846 A JPS5798846 A JP S5798846A
Authority
JP
Japan
Prior art keywords
ray
crystal
light
irradiation position
monochrometer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55175164A
Other languages
Japanese (ja)
Inventor
Koji Egami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP55175164A priority Critical patent/JPS5798846A/en
Publication of JPS5798846A publication Critical patent/JPS5798846A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To determine an irradiation position of X-ray and to perform a two- dimentional evaluation of a large-diametered crystal, by providing an X-ray irradiation position detecting mechanism which leads a light, asymmetrically reflected by a monochrometer crystal surface, onto an X-ray optical axis and irradiates the surface of a sample crystal with said light. CONSTITUTION:After an X-ray, produced from an X-ray focus 1, passes through a slit 2 and is formed into a monochrome by a monochrometer crystal 4, it passes through a slit 9 to enter a sample crystal 10. An X-ray 13 is asymmetrically reflected by the monochrometer crystal 4, and an X-ray, entering the sample crystal 10, is formed into an incident X-ray 14. Meanwhile, a visual light 15, emitted from a light source 6, is led to a light axis of an X-ray which is emitted from the X-ray focus 10 and advances, in order, to 1 Q C. This causes coinciding of an X-ray irradiation position C of the sample crystal 10 with the irradiation position of the visual light, permits determination of the irradiation position of the X-ray through the visual and direct detection of a light scattered from a point C, and permits the two-dimentional evaluation of a large- diametered crystal.
JP55175164A 1980-12-11 1980-12-11 X-ray diffractometer Pending JPS5798846A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55175164A JPS5798846A (en) 1980-12-11 1980-12-11 X-ray diffractometer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55175164A JPS5798846A (en) 1980-12-11 1980-12-11 X-ray diffractometer

Publications (1)

Publication Number Publication Date
JPS5798846A true JPS5798846A (en) 1982-06-19

Family

ID=15991378

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55175164A Pending JPS5798846A (en) 1980-12-11 1980-12-11 X-ray diffractometer

Country Status (1)

Country Link
JP (1) JPS5798846A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014076974A1 (en) * 2012-11-16 2014-05-22 パルステック工業株式会社 Diffraction ring forming device and diffraction ring forming system
CN108401437A (en) * 2015-12-11 2018-08-14 科磊股份有限公司 X-ray Scattering Metrology for High Aspect Ratio Structures

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51121388A (en) * 1975-04-16 1976-10-23 Nec Corp Apparatus for adjusting a specimen for x-ray diffration camera

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51121388A (en) * 1975-04-16 1976-10-23 Nec Corp Apparatus for adjusting a specimen for x-ray diffration camera

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014076974A1 (en) * 2012-11-16 2014-05-22 パルステック工業株式会社 Diffraction ring forming device and diffraction ring forming system
CN108401437A (en) * 2015-12-11 2018-08-14 科磊股份有限公司 X-ray Scattering Metrology for High Aspect Ratio Structures

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