JPS58106443A - 高周波誘導プラズマ発光分析装置用試料導入装置 - Google Patents

高周波誘導プラズマ発光分析装置用試料導入装置

Info

Publication number
JPS58106443A
JPS58106443A JP20479381A JP20479381A JPS58106443A JP S58106443 A JPS58106443 A JP S58106443A JP 20479381 A JP20479381 A JP 20479381A JP 20479381 A JP20479381 A JP 20479381A JP S58106443 A JPS58106443 A JP S58106443A
Authority
JP
Japan
Prior art keywords
sample
gas
introducing
pressure
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20479381A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0153413B2 (2
Inventor
Junichi Takahashi
純一 高橋
Hiroshi Ishijima
石島　博史
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP20479381A priority Critical patent/JPS58106443A/ja
Publication of JPS58106443A publication Critical patent/JPS58106443A/ja
Publication of JPH0153413B2 publication Critical patent/JPH0153413B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
    • G01N21/73—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
JP20479381A 1981-12-18 1981-12-18 高周波誘導プラズマ発光分析装置用試料導入装置 Granted JPS58106443A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20479381A JPS58106443A (ja) 1981-12-18 1981-12-18 高周波誘導プラズマ発光分析装置用試料導入装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20479381A JPS58106443A (ja) 1981-12-18 1981-12-18 高周波誘導プラズマ発光分析装置用試料導入装置

Publications (2)

Publication Number Publication Date
JPS58106443A true JPS58106443A (ja) 1983-06-24
JPH0153413B2 JPH0153413B2 (2) 1989-11-14

Family

ID=16496442

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20479381A Granted JPS58106443A (ja) 1981-12-18 1981-12-18 高周波誘導プラズマ発光分析装置用試料導入装置

Country Status (1)

Country Link
JP (1) JPS58106443A (2)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6126843A (ja) * 1984-07-17 1986-02-06 Shimadzu Corp マイクロサンプル導入装置
JPH03226656A (ja) * 1990-01-31 1991-10-07 Shimadzu Corp Ｉｃｐ発光分光分析装置の抵抗加熱気化器

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012019340A1 (zh) * 2010-08-11 2012-02-16 北京吉天仪器有限公司 检测Cr(VI)的原子荧光光谱法及光谱仪
JP7293436B1 (ja) 2022-03-11 2023-06-19 レノボ・シンガポール・プライベート・リミテッド 電子機器

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6126843A (ja) * 1984-07-17 1986-02-06 Shimadzu Corp マイクロサンプル導入装置
JPH03226656A (ja) * 1990-01-31 1991-10-07 Shimadzu Corp Ｉｃｐ発光分光分析装置の抵抗加熱気化器

Also Published As

Publication number Publication date
JPH0153413B2 (2) 1989-11-14

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