JPS58158255A - Monitor device for film thickness in multilayer thin-film forming device - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a film thickness monitoring device in a multilayer thin film forming apparatus that forms a multilayer thin film of evaporated substances from a plurality of evaporation sources on a workpiece.

Conventionally, as shown in Figs. 181 and 2, the conventional COS device moves the workpiece a over multiple evaporation sources q in the X* treatment m1ib to form multilayer O thin films d and d as shown in Ks3g. At the same time, a corner line plate tomo part g of the workpiece a0 is gradually reduced for each evaporation source in 4, which is interposed between the workpiece a0 part and the workpiece upper evaporation source C. A thin monitoring film is formed through each l! A method is known in which the film thickness is monitored (by measuring the thin film newly exposed from the lit using the projector/receiver J, Jt-, respectively) (41 Publication No. 53-40189). Therefore, this formula O is also O″1g#i
A large number of light emitting and receiving lights @J, J are installed according to the number of thin film layers.
! Also, since the installation side IJft is limited to 1 [a 4D direct line from each S, there is a drawback that it is relatively difficult to install, and it is also used as a product as the number of thin film layers increases. The thin film HO book for monitoring that cannot be used is uneconomical due to the large amount of loss.

Since the aim of this work is to solve these shortcomings locally, the workpiece is moved over multiple evaporation sources in the vacuum processing chamber to form a multilayer thin film on it, and the workpiece is integrated with the workpiece and interposed between it and each evaporation source;
In the method of monitoring the film thickness of the multilayer 011M by forming a monitoring thin film through the opening of g, and monitoring the film thickness of the multilayer 011M by turbidizing the scissors monitoring thin film with light from the emitter/receiver, The openings of the workpiece O are arranged linearly in the moving direction of the workpiece O, and the openings are formed into a plurality of openings each facing an evaporation source, and each opening is provided with a shutter for RWi. It is characterized by having been established.

To explain lfi of the implementation of this ji-device with reference to the attached drawings, in the jI4 diagram, (1) is the vacuum mm1i, and (2) is the inside of the mukoden (1) that is released from one of the poles (3a). The other roll (3b) K4I (moving polyester film and other workpieces, (4) Yuyi vacuum treatment ml)
(1) A material that evaporates from the vase evaporation source (4) is shown as an evaporation source that is arranged in the downward direction of the wrinkled workpiece (2) in the direction of movement, and is elongated in the width direction of several ratios. A multilayer thin film (2J) adheres to the surface of the workpiece (2J
Four are formed. In addition, #workpiece (2) and each evaporation source (4)
) is interposed between the opening 5 (6) and the monitoring zone (2a ) A thin layer for K monitoring is formed. The monitoring thin film (8) is connected to a floodlight (9).
A light emitting/receiving light 11 (@
The thickness is monitored, and the amount of transmitted light from the projector (9a) or the amount of reflected light from the wall tAnzo θ1, and the light received by the recording device 0 @(+ in 9) Measured at K, cough monitoring thin 1Ill(8)O! When an IX thickness O abnormality is measured, for example, the 01M emission amount of the evaporation source (4) is controlled to obtain a predetermined film thickness.

The above configuration is not particularly different from the conventional one, but the evaporation
In the %lDK, the wire plate (7) O opening (6) is arranged linearly along the moving direction of the workpiece (2) and the 4r
Evaporation 11 (4)
A portion of the evaporated material from each evaporator 1t (4) is
) to the workpiece (2) otmv area (21
) directly! For the array offilE [by making it durable as 1 [weigh], and further providing a sigitter α for opening and closing each opening (6), and opening and closing each jaw 0 intermittently). Zone (2a) K each evaporation source (4)
so that thin films (8) of the evaporated material are formed in discrete linear arrays as shown in item 65A. The metal thin film (8) is designed so that the shutter can be opened and closed quickly.
In detail, the film is formed into a film thickness shape having an inclination (8a) in the direction of movement of the workpiece (2) as shown in the figure jI7, but when measuring the film thickness, it is necessary to In front of the take-up roll (3b), the output tm of the light emitter/receiver (9) with respect to the steady portion (8b) is determined.

The shell opening (6) may be formed into an oblate pentagon instead of an oblate triangle as shown in Figs. Thing (2) O81
Each evaporation source (
4) A rectangular or triangular opening (6) having a shutter (6) may be formed continuously on the opposite side of the opening (Q3).

The operation will be explained with reference to the embodiment shown in FIGS. 4 and 5. The workpiece (2
) is moved to the right in the drawing, the evaporated substances such as Z n S * Mg Fz from each evaporation source ( 4 ) below are sequentially resistant to adhesion, and a multilayer thin film ( 5 ) is formed. In this case, if the shirt (12m) of the opening (6&) downstream in the moving direction is opened for a certain period of time, and then the shutter (12b) of the opening (6b) of m* is opened for a certain period of time, the workpiece * j1 is used for the monitoring band (2&) in (2).
61! As shown in the figure, a single-layer thin film (8) is formed linearly from each evaporation source (4), and the thickness of each thin film (8) is measured by sequentially measuring the amount of light emitted and received by one unit. Therefore, if a thin film (light) that does not have the expected film thickness appears, the evaporation source (4) that formed it can be determined by calculating backwards from the moving speed of the workpiece (2), and the amount of evaporation can be determined appropriately. In addition, although it was explained that the shutter (to) opens and closes in order from the downstream side, it is not limited to this, and any arbitrary one can be used. Furthermore, the workpiece (2) may be a lens or other single object that is moved by being attached to a long O transport belt.

In this way, when using evaporation@, the openings for forming the thin film for monitoring were arranged in a straight line and had several ratios facing each evaporation source, and each opening was provided with a shutter. The thin film for use can be made into an intermittent linear Ky#, the number of light emitting/receiving IBOs installed to monitor the thin film can be reduced to one, it can be easily manufactured in 1K, and the installation side can be separated from the evaporation source, making installation easy. In addition, because the monitoring thin film is formed, the monitoring band is relatively narrow, so there is less loss of workpieces, and single-layer OVL viewing thin film is formed. Since the multilayer thin film of the workpiece is monitored by monitoring each IIO, there are O effects such as improved monitoring accuracy.

[Brief explanation of the drawing]

1ml is a cut side view of the conventional example, and Figure 2 is its OIt-
1m cutaway box diagram, Figure 3 is an enlarged cross-sectional view of a multilayer thin film, 11
41! Q is a cross-sectional side view of the invention scissor amount 01 example O, g5is1
．． -tov-V! 16 is a bottom view of the lid workpiece; FIG. 7 is a line diagram showing the formation shape m of the monitoring thin film O;
Figures 81 to 11 are side views of the Sekiguchi section OSS example Oj. (1)--True! ! Asahi Tamaki 1 [(2) --- Workpiece (4
)...Evaporation 1 [(fs)...Multilayer thin film (6)...
- Mouth (7) Wire plate (4) Thin film for viewing (9) Light emitter/receiver mouth Shutter patent applicant Japan Vacuum Technology Co., Ltd. Kin Kitamura -5″
'. 2 other people have a large amount of weight.

Claims (1)

[Claims] The workpiece is moved over a plurality of evaporation sources in the vacuum island m1ii to form a multilayer thin film thereon, and the workpiece is interposed integrally with the workpiece and six evaporation sources. A thin film for monitoring is formed through the opening of the multilayer plate, and the film thickness of the multilayer thin film is monitored by measuring the thin film for monitoring at zero light between the emitter and the receiver. In K, the openings of # the track shoes are arranged linearly along the moving direction of the workpiece and have openings on a plurality of sides facing each evaporation source, respectively, and 1. A film thickness monitoring device for a multilayer thin film forming apparatus, characterized in that each shutter is provided with a shutter that opens and closes.