JPS58190812A - Manufacture of electrophotographic receptor - Google Patents

Manufacture of electrophotographic receptor

Info

Publication number
JPS58190812A
JPS58190812A JP7010982A JP7010982A JPS58190812A JP S58190812 A JPS58190812 A JP S58190812A JP 7010982 A JP7010982 A JP 7010982A JP 7010982 A JP7010982 A JP 7010982A JP S58190812 A JPS58190812 A JP S58190812A
Authority
JP
Japan
Prior art keywords
drum
gas
silane
photosensitive layer
glow discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7010982A
Other languages
Japanese (ja)
Inventor
Yoshiyuki Kageyama
喜之 影山
Hideki Akeyoshi
明吉　秀樹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP7010982A priority Critical patent/JPS58190812A/en
Publication of JPS58190812A publication Critical patent/JPS58190812A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45578—Elongated nozzles, tubes with holes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/507—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using external electrodes, e.g. in tunnel type reactors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To manufacture a superior electrophotographic receptor having a uniform film thickness and free from unevenness by keeping the flow of a gas contg. silane perpendicular to the surface of an electrically conductive substrate when a photosensitive layer is formed on the surface of the substrate by glow discharge using the gas. CONSTITUTION:A reactive gas contg. silane is fed from cylinders 1-3 to gas feeding pipes 16, and it is perpendicularly blown on the surface of an Al drum as a support 17 from the many holes in the pipes 16. Glow discharge is caused with a high frequency coil 21 around a container 15 while heating and rotating the support 17 on a support stand 18, and by the glow discharge the gaseous silane is decomposed to form a photosensitive layer of amorphous Si on the surface of the drum 17, thereby manufacturing an electrophotographic receptor. Since the flow of the reactive gas is perpendicular to the surface of the drum 17, the photosensitive film has high uniformity in the thickness and is free from surface unevenness.

Description

【発明の詳細な説明】 大発明は、均一々感光層膜厚を有する電子写真感光体の
製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing an electrophotographic photoreceptor having a uniform photosensitive layer thickness.

アモルファスシリコン等を感光１−とした電子写真感光
体が広く利用されているが、従来この褌の感光体を製造
した際には感光５層の膜厚の均一性が十分ではなく、又
、感光層の表面に凹凸の発生が認められ、これらは重子
写真法でコピー画像を得ようとした場合、諸々の問題点
を引起しコピー品質を損ねる原因となっていた。例えば
、潜像重荷の帯電ムラを発生させたり或いは現ｒ蒙時の
トナーの付着ムラなどを起し、その結果、斑へのあるコ
ピー画像の形成を招いた。Electrophotographic photoreceptors made of amorphous silicon or the like are widely used, but when this loincloth photoreceptor was conventionally manufactured, the thickness of the five photoreceptor layers was not sufficiently uniform, and The occurrence of irregularities on the surface of the layer was observed, and these caused various problems and caused deterioration of copy quality when attempting to obtain a copy image by the Shigeko photography method. For example, uneven charging of the latent image may occur, or uneven adhesion of toner may occur during development, resulting in the formation of a copy image with spots.

特開昭５６−４１５１号叫に開示されている電子写真感
光体製造装置によれば、シラン含有ガスはドラム状基体
を内装した反応管内部をトから下へ、つ１１′ｌドラム
表面に沿って流れグロー散布、により分解されてドラム
状基体上に堆積］〜、感光１−が形成される。According to an electrophotographic photoreceptor manufacturing apparatus disclosed in Japanese Patent Application Laid-open No. 56-4151, a silane-containing gas is passed inside a reaction tube equipped with a drum-shaped substrate from top to bottom along the drum surface. decomposed by flow glow dispersion and deposited on a drum-shaped substrate]~, photosensitive 1- is formed.

しかし々から、このようにガス流方向とドラム表面が平
行に位置していると、ガス流方向に膜厚の分布を生じ、
感光１４表面に凹凸が生じやすく、堆積の効率も十分で
はない。However, if the gas flow direction and the drum surface are located parallel to each other in this way, the film thickness will be distributed in the gas flow direction.
Irregularities tend to occur on the surface of the photosensitive layer 14, and the deposition efficiency is not sufficient.

又、感光層表面の平滑化をはかるためには感光Ｉ−表面
研磨や研削等の面倒な処理を施さ力ければならないばか
りか、かえって感光１ｍ表面をキズつける結果となった
。In addition, in order to smooth the surface of the photosensitive layer, not only was it necessary to carry out troublesome treatments such as polishing and grinding the photosensitive layer surface, but the result was that the surface of the photosensitive layer was damaged.

本発明は以上述べたような問題点に鑑み、感光１−の膜
厚の均一性が高く、表面凹凸がほとんど々く、そして研
磨や研削等の処理を必要としない電子写真感光体の製造
方法を提供することを目的とし、本発明者らはガスの流
れ方向に着目して鋭意検討を重ねた結果、シラン含有ガ
スにダロー放電を施してドラム状導電性基体表面上妊感
光ｌ１ｉｌを形成する電子写真感光体の製造方法におい
て、前記ガスが骸基体表面上に対して垂直的な流れを有
することによって前記目的が達成され本発明を完成した
、 次に、本発明の方法を図によって詳細に説明を行う。In view of the above-mentioned problems, the present invention provides a method for manufacturing an electrophotographic photoreceptor, which has a highly uniform film thickness, has almost no surface irregularities, and does not require processing such as polishing or grinding. As a result of intensive studies focusing on the direction of gas flow, the inventors of the present invention applied Darrow discharge to a silane-containing gas to form a photosensitive layer on the surface of a drum-shaped conductive substrate. In the method for manufacturing an electrophotographic photoreceptor, the above object is achieved and the present invention is completed by having the gas flow perpendicularly to the surface of the skeleton substrate.Next, the method of the present invention will be described in detail with the drawings. Give an explanation.

第１図は、本発明の方法の実施に際して使用される装置
の概略断ｎ図であわ、製造方法の概要を示すと、反応ガ
スはゼンペＩ〜３から減圧器４〜６により減圧されて供
給され質量流量調節器１０〜１２により流量を調節され
、導入管１４をとおって反応部１５内のパイレックス製
ガス供給管１６に入る。ガス供給管は円筒形状で内側面
に多数の穴がありここからガスが流出するようにしであ
る。この円筒の内側に支持体となるアルミニウムドラム
１７が設置されドラムは支持台１８により軸を中心とし
て１０　ｒｐｍ程度で回転できる。ドラム内面にはヒー
ターが設置されドラム表面温度が調節される。反応部内
で流出ガスは高周波コイル２１によってエネルギーを供
給され分解して活性な状態に々リドラム上に堆積する。FIG. 1 is a schematic cross-sectional view of the apparatus used in carrying out the method of the present invention. Showing an overview of the manufacturing method, the reaction gas is supplied from Zenpe I to 3 after being reduced in pressure by pressure reducers 4 to 6. The flow rate is adjusted by mass flow rate regulators 10 to 12, and the gas enters the Pyrex gas supply pipe 16 in the reaction section 15 through the introduction pipe 14. The gas supply pipe has a cylindrical shape and has many holes on its inner surface through which the gas flows out. An aluminum drum 17 serving as a support is installed inside this cylinder, and the drum can be rotated about an axis at about 10 rpm by means of a support stand 18. A heater is installed inside the drum to adjust the drum surface temperature. In the reaction section, the effluent gas is supplied with energy by the high frequency coil 21, decomposes, and is deposited in an active state on the lid drum.

未反応のガスは排気１１９゜２０をとおり排気される。Unreacted gas is exhausted through exhaust 119°20.

なお、図中、７．８．９は・セルノ、１３は止め弁であ
る。In addition, in the figure, 7.8.9 is a cell no. 13 is a stop valve.

以上の弱明よシ明らかなように反応ガスの流れ方向がド
ラム表面上に対し７て垂直的であるため、膜厚の均一性
が高く表面凹凸のほとんどない感光１−が得られ、又、
堆積効率も良い。As is clear from the above description, since the flow direction of the reaction gas is perpendicular to the surface of the drum, a photosensitive film with a highly uniform film thickness and almost no surface irregularities can be obtained.
Deposition efficiency is also good.

以下、実施例によシ本発明の効果を明らかにする。Hereinafter, the effects of the present invention will be clarified through examples.

実施例 第１図に示したような電子写真感光体製造装置ヲ用いて
、次の作製条件によりアモルファスシリコンの感光層を
ドラム状支持体上に形成した。EXAMPLE Using an electrophotographic photoreceptor manufacturing apparatus as shown in FIG. 1, an amorphous silicon photosensitive layer was formed on a drum-shaped support under the following manufacturing conditions.

作製条件 高周波電力５００Ｗ　１３．５６Ｍ）（。Fabrication conditions High frequency power 500W 13.56M) (.

ガ　　　　　　ス　シランガス（アルゴンベース１０％
１ガス圧力０．５　’ｒｏｒｒ ガス流量３００ｓｅｃｍ ドラム表面温度　２５０℃ 放電時間５時間 この条件で作製した感光層膜の膜厚分布を第２図に示す
。横軸はドラムの軸方向の位置（ドラム上端部基準）を
示す７．膜厚の分布は小さく±１μ常程度（約±５％）
の範囲におさまった。Gas Silane gas (argon base 10%)
1 Gas pressure 0.5'rorr Gas flow rate 300 sec Drum surface temperature 250° C. Discharge time 5 hours The film thickness distribution of the photosensitive layer film prepared under these conditions is shown in FIG. 7. The horizontal axis indicates the axial position of the drum (based on the top end of the drum). The distribution of film thickness is small, usually around ±1μ (approx. ±5%)
It fell within the range of

【図面の簡単な説明】[Brief explanation of drawings]

第１図は、本発明の方法の実施に際して使用される装置
の概略断面図であシ、＃！２図は実施例の結果を示すグ
ラフである。 １〜３・・・Ｉンペ　　　　１４・・・導入管１５・・
・反応部　　　　　１６・・・ガス供給管１７・・・ド
ラム　　　　　１８・・・支持台２１・・・高周波コイ
ル ＝　５−FIG. 1 is a schematic cross-sectional view of the apparatus used in carrying out the method of the present invention. Figure 2 is a graph showing the results of the example. 1-3...Impe 14...Introduction pipe 15...
・Reaction part 16... Gas supply pipe 17... Drum 18... Support stand 21... High frequency coil = 5-

Claims (1)

【特許請求の範囲】[Claims] １、　シラン含有ガスにダロー放電を施してトラム状導
電性基体表面」二に感光層を形成する電子写真感光体の
製造方法において、前記ガスが該基体表面上に対１〜て
垂直的な流れを有することを特徴とする電子写真感光体
の製造方法。1. A method for producing an electrophotographic photoreceptor in which a silane-containing gas is subjected to Darrow discharge to form a photosensitive layer on the surface of a tram-shaped conductive substrate, in which the gas flows vertically on the surface of the substrate. A method for manufacturing an electrophotographic photoreceptor, comprising:
JP7010982A 1982-04-26 1982-04-26 Manufacture of electrophotographic receptor Pending JPS58190812A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7010982A JPS58190812A (en) 1982-04-26 1982-04-26 Manufacture of electrophotographic receptor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7010982A JPS58190812A (en) 1982-04-26 1982-04-26 Manufacture of electrophotographic receptor

Publications (1)

Publication Number Publication Date
JPS58190812A true JPS58190812A (en) 1983-11-07

Family

ID=13422040

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7010982A Pending JPS58190812A (en) 1982-04-26 1982-04-26 Manufacture of electrophotographic receptor

Country Status (1)

Country Link
JP (1) JPS58190812A (en)

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