JPS5819323A - 光重合性樹脂およびその製造法 - Google Patents

光重合性樹脂およびその製造法

Info

Publication number
JPS5819323A
JPS5819323A JP11965682A JP11965682A JPS5819323A JP S5819323 A JPS5819323 A JP S5819323A JP 11965682 A JP11965682 A JP 11965682A JP 11965682 A JP11965682 A JP 11965682A JP S5819323 A JPS5819323 A JP S5819323A
Authority
JP
Japan
Prior art keywords
group
carbon atoms
formula
atoms
carbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11965682A
Other languages
English (en)
Japanese (ja)
Other versions
JPH029615B2 (da
Inventor
ロ−デリツク・ドナルド・ハサウエイ
エドワ−ド・ア−ビング
ジヨン・シドネイ・ウオ−タ−ハウス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of JPS5819323A publication Critical patent/JPS5819323A/ja
Publication of JPH029615B2 publication Critical patent/JPH029615B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP11965682A 1981-07-09 1982-07-09 光重合性樹脂およびその製造法 Granted JPS5819323A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB8121172 1981-07-09
GB8121172 1981-07-09
GB8209955 1982-04-03

Publications (2)

Publication Number Publication Date
JPS5819323A true JPS5819323A (ja) 1983-02-04
JPH029615B2 JPH029615B2 (da) 1990-03-02

Family

ID=10523118

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11965682A Granted JPS5819323A (ja) 1981-07-09 1982-07-09 光重合性樹脂およびその製造法

Country Status (1)

Country Link
JP (1) JPS5819323A (da)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60166306A (ja) * 1984-02-09 1985-08-29 Daicel Chem Ind Ltd 光重合開始剤

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60166306A (ja) * 1984-02-09 1985-08-29 Daicel Chem Ind Ltd 光重合開始剤

Also Published As

Publication number Publication date
JPH029615B2 (da) 1990-03-02

Similar Documents

Publication Publication Date Title
US5621019A (en) Monomer having vinyl group, polymer thereof and photosensitive resin including those
AU672645B2 (en) Novel (cyclo)aliphatic epoxy compounds
DE2153860C2 (de) Verwendung von photopolymerisierbaren Gemischen zur Herstellung ätzmittelbeständiger Masken
JPH1135552A (ja) 新規なジアゾメタン化合物
HK1005623B (en) New(cyclo) aliphatic epoxy compounds
JPS5928897B2 (ja) カガクセンホウシヤニタイスル カンコウセイザイリヨウ
JPH04503364A (ja) 光開始強酸源としての熱安定性カルバゾールジアゾニウム塩
JPS5948760A (ja) 像生成法
CN115595001B (zh) 一种光敏聚合物组合物及其制备方法和全息衍射光栅元件
CN103992222A (zh) 新的丙烯酸类单体、聚合物以及包含该聚合物的抗蚀剂组合物
JPS5819323A (ja) 光重合性樹脂およびその製造法
SE450547B (sv) Polymeriserbar dentalkomposition med accelererad herdningshastighet
JPS5837078A (ja) フオトクロミツク感光性組成物
JPWO2008126499A1 (ja) ポリマー光導波路形成用材料、ポリマー光導波路、及びポリマー光導波路製造方法
JP3033549B2 (ja) ネガ型レジスト材料、それを用いたパターン形成方法及び半導体装置の製造方法
JPS62284354A (ja) フォトレジスト並びに該フォトレジストを有する製品の製法
US5624788A (en) Organic silicon compound, resist thermal polymerization composition and photopolymerization composition
US4392930A (en) Photopolymerizable resins
JPH0756354A (ja) 珪素含有高分子化合物及びそれを用いたレジスト材 料
KR920013028A (ko) 광증감제 조성물
JPS61292634A (ja) フオトレジスト用ポリマ−組成物
Davies et al. Imaging of Aliphatic polycarbonates with photogenerated base
JP3460212B2 (ja) 感放射線性樹脂組成物
DE2352348A1 (de) Funktionelles polymeres und damit durchfuehrbares bildwiedergabeverfahren
JPS6361651B2 (da)